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Displaying records 41 to 50 of 78 records.
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41. Structural, Electronic, and Dielectric Properties of Ultrathin Zirconia Films on Silicon
Published: 4/1/2005
Authors: Safak Sayan, Nhan V Nguyen, James R. Ehrstein, Tom Emge, Eric Garfunkel, Mark Croft, Xinjian Zhou, David V Vanderbilt, Igor Levin, Evgeni Gusev, Hyunjung Grace Kim, P J. McIntyre
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31990

42. Crystalline Quality of Bonded Silicon-On-Insulator Characterized by Spectroscopic Ellipsometry and Raman Spectroscopy
Published: 10/4/2004
Authors: Nhan V Nguyen, James E Maslar, Junghyeun Kim, Jin-Ping Han, Jin-Won Park, Deane Chandler-Horowitz, Eric M. Vogel
Abstract: The crystalline quality of Silicon-On-Insulator fabricated by a wafer bonding technique was examined by spectroscopic ellipsometry and Raman spectroscopy. The detailed modeling of the experimental ellipsometric data yields information about structura ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31511

43. Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study
Published: 10/1/2004
Authors: M P. Seah, S J. Spencer, F Bensebaa, I Vickridge, H Danzebrink, Michael Krumrey, T Gross, W Oesterle, E Wendler, B Rheinlander, Yasushi Azuma, I Kojima, N Suzuki, M Suzuki, Shigeo Tanuma, D W. Moon, Hansuek Lee, H Cho, H Y. Chen, A T. Wee, T Osipowicz, J S. Pan, W A. Jordaan, R Hauert, U Klotz, C van der marel, M Verheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, Nhan V Nguyen, Deane Chandler-Horowitz, James R. Ehrstein, D Muller, Joseph A Dura
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31994

44. Comparative Thickness Measurements of SiO^d2^/Si Films for Thickness Less than 10 nm
Published: 1/1/2004
Authors: Terrence J Jach, Joseph A Dura, Nhan V Nguyen, J R. Swider, G Cappello, Curt A Richter
Abstract: We report on a comparative measurement of SiO^d2^/Si dielectric film thickness (t < 10 nm) using grazing incidence x-ray photoelectron spectroscopy, neutron reflectometry, and spectroscopic ellipsometry. Samples with nominal thicknesses of 3 nm to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831275

45. Comparative Thickness Measurements of SiO^d2^/Si Films for Thicknesses Less than 10 nm
Published: 1/1/2004
Authors: Terrence J Jach, Joseph A Dura, Nhan V Nguyen, J Swider, G Cappello, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31662

46. Ultra-thin SiO^d2^ on Si, Part V: Results of a CCQM Pilot Study of Thickness Measurements
Published: 12/1/2003
Authors: M P. Seah, S J. Spencer, F Bensebaa, I Vickridge, H Danzebrink, Michael Krumrey, T Gross, W Oesterle, E Wendler, B Rheinlander, Yasushi Azuma, I Kojima, N Suzuki, M Suzuki, Shigeo Tanuma, D W. Moon, Hansuek Lee, H Cho, H Y. Chen, A T. Wee, T Osipowicz, J S. Pan, W A. Jordaan, R Hauert, U Klotz, C van der marel, M Verheijen, Y Tamminga, C Jeynes, P Bailey, S Biswas, U Falke, Nhan V Nguyen, Deane Chandler-Horowitz, James R. Ehrstein, D Muller, Joseph A Dura
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31596

47. Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors
Published: 10/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840180

48. Assessment of Utlra-thin SiO2 Film Thickness Meaurement Precision by Ellipsometry
Published: 9/30/2003
Authors: Deane Chandler-Horowitz, Nhan V Nguyen, James R. Ehrstein
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31461

49. Optical properties of Jet-Vapor-Deposited TiAlO and HfAlO Determined by Vacuum Utraviolet Spectroscopic Elliposmetry
Published: 9/30/2003
Authors: Nhan V Nguyen, Jin-Ping Han, Jin S. Kim, Yong Jai Cho, Wenjuan Zhu, Zhijiong Luo, T P Ma
Abstract: In this report, we use vacuum ultraviolet spectroscopic ellipsometry (VUV-SE) to determine the optical as well as structural properties of high-k metal oxides, in particular, of Hafnium Aluminates and Titanium Aluminates. Two sets of samples consisti ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31379

50. Design and Performance of Capping Layers for EUV Multilayer Mirrors
Published: 6/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840159



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