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1. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909147

2. Cellulose Nanocrystals the Next Big Nano-thing?
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

3. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

4. Development of the Metrology and Imaging of Cellulose Nanocrystals
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905543

5. Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy
Series: Special Publication (NIST SP)
Report Number: 1170
Published: 2/3/2014
Authors: Michael T Postek, Andras Vladar, Bin Ming, Bunday Benjamin
Abstract: Reference Material (RM) 8820 is a multipurpose instrument calibration standard available from NIST. This is a dimensional standard initially developed to replace the out of stock RM 8090 used for X and Y scale calibrations of scanned particle beam mi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914808

6. Focused Ion Beam Manufacturing Methods for Nickel-Titanium Shape-Memory Alloy Thin Films
Published: 6/4/2007
Authors: Gordon Allan Shaw, Koo-Hyun Chung, Bin Ming, Andras Vladar
Abstract: Nickel-titanium shape-memory alloy is an interesting and technologically relevant material that can recover large amounts of mechanical strain through a thermally-activated phase transformation. Because of is unusual properties, it has been used wide ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824622

7. On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes
Published: 3/1/2009
Authors: Andras Vladar, Michael T Postek, Bin Ming
Abstract: All forms of microscopy are being pushed to the limit by nanotechnology. Hence, there is a relentless quest to achieve better and better resolution with various electron and ion microscopes and to monitor and maintain these instruments to achieve the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901833

8. On the Sub-Nanometer Resolution of Scanning Electron and Scanning Helium Ion Microscopes
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901569

9. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902762

10. Review of Current Progress in Nanometrology with Helium Ions
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541



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