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You searched on: Author: egon marx

Displaying records 21 to 30 of 58 records.
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21. Scattering by Dielectric Strips on a Dielectric Layer of Finite Thickness
Published: 1/1/2004
Author: Egon Marx
Abstract: Accurate simulation of optical images of lines and trenches placed on semiconductors are of great interest to industry, especially in the overlay process.  Similarly, optical images of photomasks in the transmission mode are also of interest. &n ...

22. Scattering by a Sphere with a Dielectric Half-Space or on Another Sphere
Published: 1/1/2004
Author: Egon Marx
Abstract: Particle contamination of dielectric or conducting surfaces can be detected by shining light on the surface and looking for abnormal scattering distributions.  This procedure can be simulated by computing the scattering distribution for a dielec ...

23. Calibration Strategies for Overlay and Registration Metrology
Published: 5/1/2003
Authors: Richard M Silver, Michael T. Stocker, Ravikiran Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, ...

24. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...

25. Beauty Baryons and Neutrinos as Dark Matter
Published: 1/1/2003
Author: Egon Marx
Abstract: Dark matter, according to a model of strong, weak, and electromagnetic interactions of elementary particles called the SWEEP model, is composed of beauty baryons and neutrions. In this model, all particles are composed of only three basic particle: t ...

26. Computed Images of Dielectric Strips on a Substrate
Published: 1/1/2003
Author: Egon Marx
Abstract: Accurate computed optical images of lines and trenches placed on semiconductors are of great interest to the manufacturers of computer components, especially in the overlay process for different layers. These images do not accurately reflect the form ...

27. Numerical Experiments in Scattering by a Dielectric Wedge
Published: 1/1/2003
Author: Egon Marx
Abstract: A general discussion of the scattering of plane monochromatic waves by dielectric wedges precedes this paper. Numerical solutions of the problem of scattering by a dielectric wedge of finite cross section, with special emphasis on the divergent behav ...

28. Scattering by Wedges
Published: 1/1/2003
Author: Egon Marx
Abstract: Some of the components of the fields produced by an incident plane monochromatic wave scattered by a wedge diverge near the edge of the wedge. Rigorous solutions for the fields scattered by a perfectly conducting infinite wedge have been obtained, bu ...

29. Optical Reflectance of Metallic Coatings: Effect of Aluminum Flake Orientation
Published: 9/1/2002
Authors: Li Piin Sung, Maria E Nadal, M E. McKnight, Egon Marx, B Laurenti
Abstract: The orientation of platelet-like pigments in coatings is affected by the processing conditions resulting in appearance variations of the final product. A set of aluminum-flake pigmented coatings having different flake orientations was pre-pared usin ...

30. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models
Published: 7/1/2002
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, Jay Shi Jun, Egon Marx, Robert D. Larrabee, B Russo, M P Davidson
Abstract: In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool ...

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Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series