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Author: egon marx

Displaying records 11 to 20 of 58 records.
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11. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran (Ravikiran) Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823206

12. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published: 7/3/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer. When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822388

13. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822387

14. Simulation of Optical Microscope Images for Photomask Feature Size Measurements
Published: 1/1/2005
Authors: Egon Marx, James Edward Potzick
Abstract: Features on photomasks used in the semiconductor industry have steadily decreased in size to fit more elements on a wafer.  When the size becomes smaller than the wavelength of the light used in a microscope, simulation becomes an important part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822252

15. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran (Ravikiran) Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

16. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

17. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

18. Ray Model of Light Scattering by Flake Pigments or Rough Surfaces With Smooth Transparent Coatings
Published: 2/1/2004
Authors: Egon Marx, Thomas Avery Germer
Abstract: We derive expressions for the intensity and polarization of light singly scattered by flake pigments or a rough surface beneath a smooth transparent coating using the ray or facet model. The distribution of local surface normals is used to calculate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822395

19. Ray Model of Light Scattering by Flake Pigments or Rough Surfaces With Smooth Transparent Coatings
Published: 2/1/2004
Authors: Thomas Avery Germer, Egon Marx
Abstract: We derive expressions for the intensity and polarization of light singly scattered by flake pigments or a rough surface beneath a smooth transparent coating using the ray or facet model. The distribution of local surface normals is used to calculate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841758

20. Effect of Trace Subdivision on the Computation of Power Spectral Densities
Published: 1/1/2004
Author: Egon Marx
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822154



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