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Author: john lu

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11. Form-Profiling of Optics Using the Geometry Measuring Machine and NIST M-48 CMM
Published: 1/1/2006
Authors: Nadia Machkour-Deshayes, John Richard Stoup, John Lu, Johannes A Soons, Ulf Griesmann, Robert S. Polvani
Abstract: We are developing an instrument, the Geometry Measuring Machine (GEMM), to measure the profile errors of aspheric and free form optical surfaces, which require measurement uncertainties near 1nm. Using GEMM, an optical profile is reconstructed from ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822545

12. Radiochemical Neutron Activation Analysis for Certification of Ion-Implanted Phosphorus in Silicon
Published: 7/11/2003
Authors: Rick L Paul, David S Simons, William F Guthrie, John Lu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903386

13. Some Approaches to the Statistical Analysis of the Overall Molecular Mass Distribution of Synthetic Polymers
Published: Date unknown
Authors: Kathleen M. Flynn, John Lu, Stephanie J Wetzel, Jennifer Huckette
Abstract: Two approaches to the statistical analysis of molecular mass distribution data derived from mass spectrometry are presented.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852832

14. Statistical Methods For Holistic Mass Spectral Analysis
Published: Date unknown
Authors: John Lu, Charles Martin Guttman
Abstract: Analysis of molecular mass distribution data for characterizing the complex synthetic polymer structure has demanded new statistical methods. As with many other high throughput measurement devices, typically only very small number of replicates can b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50900



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