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You searched on: Author: eric lin Sorted by: title

Displaying records 1 to 10 of 197 records.
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1. Effect of Copolymer Composition on Acid Catalyzed Deprotection Reaction Kinetics in Model Photoresists
Published: 6/25/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: The kinetics of an acid-catalyzed deprotection reaction in model photoresist materials was studied as a function of copolymer composition with Fourier Transform Infrared spectroscopy. A mathematical model was developed to analyze the acid catalyzed ...

2. X-Ray Absorption Spectroscopy to Probe Interfacial Issues in Photolithography
Published: 2/1/2003
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A Fischer, S Sambasivan, Eric K Lin, Ronald Leland Jones, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers1. Here we utilize near edge X-ray a ...

3. 3-Dimensional Lineshape Metrology Using Small Angle X-ray Scattering
Published: 9/1/2003
Authors: Ronald Leland Jones, T J Hu, Eric K Lin, Wen-Li Wu, D M Casa, G G Barclay
Abstract: The need for sub-nanometer precision metrology of dense patterns for future technology nodes challenges current methods based on light scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). We provide results of initi ...

4. A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension
Published: 1/28/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of process ...

5. A Molecular Model for Toughening in Double-Network Hydrogels
Published: 6/18/2008
Authors: Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K Lin, Jian P. Gong, Paul D Butler, Wen-Li Wu
Abstract: A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1-propanesulfonicacid) (PAMPS) polyelectrolyte network and polyacrylamide (PAAm) linear polymer. It ...

6. A Three-Phase Model for the Structure of Porous Thin Films Determined by X-Ray Reflectivity and Small Angle Neutron Scattering
Published: 4/1/2000
Authors: Wen-Li Wu, Eric K Lin, C Jin, J T Wetzel
Abstract: A methodology to characterize nanoporous thin films based on a novel combination of high resolution specular x-ray reflectivity and small angle neutron scattering has been advanced to accommodate heterogeneities within the material surrounding nanosc ...

7. Abstracts for the MSEL Assessment Panel, March 2001
Published: 1/26/2001
Authors: Leslie E Smith, Alamgir Karim, Leonid A Bendersky, C Lu, J J Scott, Ichiro Takeuchi, Kathleen M. Flynn, Vinod K Tewary, Davor Balzar, G A Alers, Stephen E Russek, Charles C. Dr. Han, Haonan Wang, William E Wallace, Daniel A Fischer, K Efimenko, Wen-Li Wu, Jan Genzer, Joseph C Woicik, Thomas H. Gnaeupel-Herold, Henry Joseph Prask, Charles F Majkrzak, Norman F. Berk, John Barker, Charles J. Glinka, Eric K Lin, Ward L Johnson, Paul R Heyliger, David Thomas Read, R R Keller, J Blendell, Grady S White, Lin-Sien H Lum, Eric J Cockayne, Igor Levin, C E Johnson, Maureen E Williams, Gery R Stafford, William J Boettinger, Kil-Won Moon, Daniel Josell, Daniel Wheeler, Thomas P Moffat, W H Huber, Lee J Richter, Clayton S. Yang, Robert D Shull, R A. Fry, Robert D McMichael, William F. Egelhoff Jr., Ursula R Kattner, James A Warren, Jonathan E Guyer, Steven P Mates, Stephen D Ridder, Frank S. Biancaniello, D Basak, Jon C Geist, Kalman D Migler
Abstract: Abstracts relating to research and development in the NIST Materials Science and Engineering Laboratory (MSEL) are presented for a poster session to be presented to the 2001 MSEL Assessment Panel.

8. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...

9. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...

10. Chain Conformation in Ultrathin Polymer Films
Published: 12/1/2002
Authors: Ronald Leland Jones, Christopher L Soles, Francis W. ~undefined~undefined~undefined~undefined~undefined Starr, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, D L Goldfarb, M Angelopolous
Abstract: Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D < RG,Bulk. Where D is the film thickness and RG,Bulk is the bulk radius of gyr ...

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