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Author: eric lin

Displaying records 161 to 170 of 198 records.
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161. Design of Nanoporous Ultra Low-Dielectric Constant Organosilicates by Self-Assembly
Published: 4/1/2001
Authors: S Y Yang, T L Dull, J Sun, A F Yee, P Mirau, C S Pai, O Nalamasu, E Reichmanis, Eric K Lin, V. J. Lee, D Gidley, W E Frieze
Abstract: Here we report a new class of materials that can reach ultra low- dielectric constants while maintaining good mechanical properties. In this approach, amphiphilic triblock copolymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PP ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851799

162. Structure and Property Characterization of Porous Low-k Dialectric Constant Thin Films Using X-ray Reflectivity and Small Angle Neutron Scattering
Published: 4/1/2001
Authors: Eric K Lin, Wen-Li Wu, C Jin, J T Wetzel
Abstract: A novel methodology using a combination of high energy ion scattering x-ray reflectivity, and small angle neutron scattering is used to characterize the structure and properties of porous low-k dielectric films after varying process conditions. From ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851834

163. Structure and Property Characterization of Low-k Dielectric Porous Thin Films
Published: 4/1/2001
Authors: Barry J. Bauer, Eric K Lin, V. J. Lee, Haonan Wang, Wen-Li Wu
Abstract: High-resolution X-ray reflectivity and small angle neutron scattering measurements are used as complementary techniques to characterize the structure and properties of porous thin films for use as low-k interlevel dielectric (ILD) materials. With th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851702

164. Thermal Expansion of Supported Thin Polymer Films: A Direct Comparison of Free Surface vs. Total Confinement
Published: 4/1/2001
Authors: D J Pochan, Eric K Lin, Sushil K. Satija, Wen-Li Wu
Abstract: Neutron Reflectivity measurements on thin, deuterated polystyrene films reveal a strong dependence of the polymer melt coefficient of thermal expansion (CTE) on both the thickness of the film and the specific pair of substrate and superstrate confine ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851654

165. Structure and Property Characterization of Porous Low-k Dielectric Constant Thin Films Using X-ray Reflectivity and Small Angle Neutron Scattering
Published: 2/1/2001
Authors: Eric K Lin, Wen-Li Wu, C Jin, J T Wetzel
Abstract: A novel methodology using a combination of high energy ion scattering, x-ray reflectivity, and small angle neutron scattering is developed to characterize the structure and properties of porous thin films for use as low-k dielectric materials. Ion s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851750

166. Abstracts for the MSEL Assessment Panel, March 2001
Published: 1/26/2001
Authors: Leslie E Smith, Alamgir Karim, Leonid A Bendersky, C Lu, J J Scott, Ichiro Takeuchi, Kathleen M. Flynn, Vinod K Tewary, Davor Balzar, G A Alers, Stephen E Russek, Charles C. Dr. Han, Haonan Wang, William E Wallace III, Daniel A Fischer, K Efimenko, Wen-Li Wu, Jan Genzer, Joseph C Woicik, Thomas H Gnaeupel-Herold, Henry Joseph Prask, Charles F. Majkrzak, Norman F. Berk, John G Barker, Charles J. Glinka, Eric K Lin, Ward L Johnson, Paul R Heyliger, David Thomas Read, R R Keller, J Blendell, Grady S White, Lin-Sien H Lum, Eric J Cockayne, Igor Levin, C E Johnson, Maureen E Williams, Gery R Stafford, William J Boettinger, Kil Won Moon, Daniel Josell, Daniel Wheeler, Thomas P Moffat, W H Huber, Lee J Richter, Clayton S. Yang, Robert D Shull, R A. Fry, Robert D McMichael, William F. Egelhoff Jr., Ursula R Kattner, James A Warren, Jonathan E Guyer, Steven P Mates, Stephen D Ridder, Frank S. Biancaniello, D Basak, Jon C Geist, Kalman D Migler
Abstract: Abstracts relating to research and development in the NIST Materials Science and Engineering Laboratory (MSEL) are presented for a poster session to be presented to the 2001 MSEL Assessment Panel.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850052

167. Comparative Study of Pore Size of Low-Dielectric-Contant Porous Spin-on-Glass Films with Different Ways of Non-destructive Instrumentation
Published: 1/1/2001
Authors: E Kondoh, M R Baklanov, Eric K Lin, D W Gidley, A Nakashima
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853771

168. Comparative Study of Porous SOG Films with Different Non-Destructive Instrumentation
Published: 1/1/2001
Authors: M R Baklanov, E Kondoh, Eric K Lin, D W Gidley, V. J. Lee, K P Mogilnikov, J N Sun
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853742

169. Confinement Induced Deviation in Ultra-thin Photoresist Films
Published: 1/1/2001
Authors: Christopher L Soles, Eric K Lin, Wen-Li Wu, Q Lin, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853792

170. Design of a Nanoporous Ultra Low-Dielectric Constant Organosilicate
Published: 1/1/2001
Authors: S Y Yang, C S Pai, O Nalamasu, E Reichmanis, P Mirau, Y S Obeng, J Seputro, Eric K Lin, V. J. Lee
Abstract: A new class of organosilicate has been developed that can attain an ultra low-dielectric constant, k of less than 2.0, with high dielectric breakdown strength (> 2 MV/cm). In this approach, a series of triblock polymers, poly(ethylene oxide-b-propyl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851922



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