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Author: hae-jeong lee

Displaying records 21 to 30 of 37 records.
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21. Characterization of Ordered Mesoporous Silica Films Using Small Angle Neutron Scattering and X-Ray Porosimetry
Published: 2/23/2005
Authors: B D. Vogt, R A. Pai, Hae-Jeong Lee, R C. Hedden, Christopher L Soles, Wen-Li Wu, Eric K Lin, Barry J. Bauer, J J. Watkins
Abstract: Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-b-PPO-b-PEO, films doped with p-toluenesulfonic acid ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852370

22. Substrate Influence on Moisture Absorption Into Thin Poly(vinyl pyrrolidone) Films
Published: 1/1/2005
Authors: B D. Vogt, Christopher L Soles, Hae-Jeong Lee, Eric K Lin, Wen-Li Wu
Abstract: The influence of substrate surface energy on the swelling of poly(vinyl pyrrolidone) (PVP) films was examined using x-ray reflectivity (XR) and quartz crystal microbalance (QCM) measurements. Two different silicon surface treatments were used for th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852389

23. Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry
Published: 7/2/2004
Authors: R C. Hedden, Hae-Jeong Lee, Christopher L Soles, Barry J. Bauer
Abstract: A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. The technique is applied to characterize a spin-on organosilicate low dielectric constant (low-k) material wi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852279

24. X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films
Published: 6/1/2004
Authors: Hae-Jeong Lee, B D. Vogt, Christopher L Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K Lin, Gwi-Gwon Kang, Min-Jin Ko
Abstract: Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852308

25. Moisture Absorption and Absorption Kinetics in Polyelectrolyte Films: Influence of Film Thickness
Published: 2/1/2004
Authors: B D. Vogt, Christopher L Soles, Hae-Jeong Lee, Eric K Lin, Wen-Li Wu
Abstract: Specular x-ray reflectivity (XR) and quartz crystal microbalance (QCM) measurements were used to determine the absorption of water into thin poly(4-ammonium styrenesulfonic acid) films from saturated vapor at 25 ?C. The effect of film thickness ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852219

26. Confinement Effects on Mositure Absorption Kinetics in Polyelectrolyte Films
Published: 9/1/2003
Authors: B D. Vogt, Christopher L Soles, Hae-Jeong Lee, Eric K Lin, Wen-Li Wu
Abstract: Quartz crystal microbalance (QCM) measurements were used to determine the absorption of water into thin poly(4-ammonium styrenesulfonic acid) films from saturated vapor at 25 C. The effect of film thickness on the absorption kinetics was inves ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852187

27. Structural Characterization of Methylsilsequioxane-Based Porous Low-k Thin Films Using X-Ray Porosimetry
Published: 6/1/2003
Authors: Hae-Jeong Lee, Christopher L Soles, Da-Wei Liu, Barry J. Bauer, Eric K Lin, Wen-Li Wu
Abstract: X-ray porosimetry is used to characterize structural characteristics, including pore size distribution, average density, wall density, and porosity, of methylsilsesquioxane based porous low-k dielectric films with varying porogen loading contents. W ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852134

28. Characterization of Nanoporous Low-k Thin Films by Contrast Match SANS
Published: 4/1/2003
Authors: R C. Hedden, Barry J. Bauer, Hae-Jeong Lee
Abstract: Small-angle neutron scattering (SANS) contrast variation is used to characterize matrix properties and pore size in nanoporous low-k thin films. Using a vapor adsorption technique, SANS measurements are used to identify a contrast match solvent mix ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852194

29. Determination of Pore Size Distributions in Nanoporous Low-K Thin Films From Small Angle Neutron Scattering
Published: 4/1/2003
Authors: Barry J. Bauer, R C. Hedden, Hae-Jeong Lee, Christopher L Soles, Da-Wei Liu
Abstract: Small angle neutron and x-ray scattering (SANS, SAXS) are powerful tools in determination of the pore size and content of nano-porous materials with low dielectric constants (low-k) that are being developed as interlevel dielectrics. Several models ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852180

30. Pore Size Distributions in Low-K Dielectric Thin Films From X-Ray Porosimetry
Published: 10/1/2002
Authors: Hae-Jeong Lee, Christopher L Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu
Abstract: X-ray reflectivity has been used to determine the mass uptake of probe molecules in porous thin films supported on thick silicon wafers. The adsorption occurs by capillary condensation when the films are exposed to probe vapor at controlled partial ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852050



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