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Author: john kramar
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1. Reference Materials 8096 and 8097 - The MEMS 5-in-1 RMs: Homogeneous and Stable
Published: 5/14/2014
Authors: Janet M Cassard, Jon C Geist, John A Kramar
Abstract: The NIST Microelectromechanical Systems (MEMS) 5-in-1 Reference Materials (RMs) were developed to assist users in validating their use of five documentary standard test methods. A Reference Material can be defined as a material whose property values ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914939

2. Kinematic Modeling and Calibration of a Flexure Based Hexapod Nanopositioner
Published: 8/21/2012
Authors: Hongliang Shi, Hai-Jun Su, Nicholas G Dagalakis, John A Kramar
Abstract: This paper covers the kinematic modeling of a flexure-based, hexapod nanopositioner and a new method of calibration for this type of nanopositioner. This six degrees of freedom tri-stage nanopositioner can generate small displacement, high-resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911830

3. Atomic Force Microscope Cantilever Flexural Stiffness Calibration: Toward a Standard Traceable Method
Series: Journal of Research (NIST JRES)
Published: 7/1/2011
Authors: Richard Swift Gates, Mark Reitsma, John A Kramar, Jon Robert Pratt
Abstract: The evolution of the atomic force microscope into a useful tool for measuring mechanical properties of surfaces at the nanoscale has spurred the need for more precise and accurate methods for calibrating the spring constants of test cantilevers. Gro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906987

4. TSOM Method for Semiconductor Metrology
Published: 4/18/2011
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

5. Scanning Probe Microscope Dimensional Metrology at NIST
Published: 12/21/2010
Authors: John A Kramar, Ronald G Dixson, Ndubuisi George Orji
Abstract: Scanning probe microscopy (SPM) dimensional metrology efforts at the U.S. National Institute of Standards and Technology are reviewed. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905420

6. A COMPACT, COMPOUND ACTUATOR FOR THE MOLECULAR MEASURING MACHINE
Published: 10/19/2008
Authors: Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A Kramar
Abstract: A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we descri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824698

7. Comparison of NIST SI Force Scale to NPL SI Mass Scale
Published: 10/19/2008
Authors: Christopher W. Jones, John A Kramar, Stuart Davidson, Richard Leach, Jon Robert Pratt
Abstract: Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824727

8. SI traceable calibration of an instrumented indentation sensor spring constant using electrostatic force
Published: 9/22/2008
Authors: Koo-Hyun Chung, Stefan Scholz, Gordon Allan Shaw, John A Kramar, Jon Robert Pratt
Abstract: We present a measurement scheme for creating reference electrostatic forces that are traceable to the International System of Units (SI). This scheme yields references forces suitable for calibrating the force sensitivity of instrumented indentation ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823024

9. Spring constant calibration of AFM cantilevers with a piezosensor transfer standard
Published: 9/24/2007
Authors: Eric Langlois, Gordon Allan Shaw, John A Kramar, Jon Robert Pratt, Donna C. Hurley
Abstract: We describe a method to calibrate the spring constants of cantilevers for atomic force microscopy (AFM). The method makes use of a piezosensor comprised of a piezoresistive cantilever and  accompanying electronics. The piezosensor was calibrated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824626

10. Instrumentation, Metrology, and Standards for Nanomanufacturing
Published: 9/10/2007
Authors: Michael T Postek, Andras Vladar, John A Kramar, L A Stern, John Notte, Sean McVey
Abstract: Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824601



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