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Author: john kramar

Displaying records 41 to 50 of 55 records.
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41. Kinematic Modeling and Analysis of a Planar Micro-Positioner
Published: 1/1/2001
Authors: Nicholas G Dagalakis, John A Kramar, E Amatucci, Robert Bunch
Abstract: The static and dynamic performance of a control system depends on the accuracy of the mathematical model of the plant that is being controlled. In this work, the accuracies of a linear and a second-order kinematic model were evaluated for a two-dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821767

42. Molecular Measuring Machine Design and Performance
Published: 1/1/2001
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E Clayton Teague
Abstract: We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microsc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821689

43. SI Traceability of Force at the Nanonewton Level
Published: 1/1/2001
Authors: David B Newell, Jon Robert Pratt, John A Kramar, Douglas T Smith, L Feeney, Edwin Ross Williams
Abstract: Although nanonewton force measurements are commonplace in industry, no National Measurement Institute supports a link to the International System of Units (SI) below one newton. The National Institute of Standards and Technology has launched a five-y ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821766

44. Molecular Measuring Machine Design and Measurements
Published: 5/1/2000
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821763

45. Performance Evaluation of a Parallel Cantilever Biaxial Micropositioning Stage
Published: 1/1/2000
Authors: E Amatucci, Nicholas G Dagalakis, John A Kramar, Fredric Scire
Abstract: The phenomenal growth of opto-electronic manufacturing and future applications in micro and nano manufacturing has raised the need for low-cost high performance micro-positioners. The National Institutes of Standards and Technology (NIST) Advanced Te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821764

46. Grating Pitch Measurements With the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

47. Grating Pitch Measurements with the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820128

48. Toward Nanometer Accuracy Measurements
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820933

49. The Molecular Measuring Machine
Published: 1/1/1998
Authors: John A Kramar, E Gilsinn, E Amatucci, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
Abstract: To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of Standards and Technology (NIST) has designed and built an instrument¿called the Molecular ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820127

50. Measurement of Patterned Film Linewidth for Interconnect Characterization
Published: 12/31/1995
Authors: Loren W. Linholm, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore, Santos D Mayo, Harry A. Schafft, John A Kramar, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16737