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Author: joseph kopanski
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Displaying records 1 to 10 of 110 records.
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1. Broad-Band Microwave-Based Metrology Platform Development: Demonstration of In-Situ Failure Mode Diagnostic Capabilities for Integrated Circuit Reliability Analyses
Published: 11/7/2014
Authors: Lin You, Chukwudi Azubuike Okoro, Jungjoon Ahn, Joseph J Kopanski, Yaw S Obeng, Rhonda R Franklin
Abstract: In this paper, we discuss the use of broadband high frequency electromagnetic waves (RF) to non- destructively identify, classify and characterize performance-limiting defects in emerging nanoelectronic devices. As an illustration, the impact of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917121

2. Electrical Scanning Probe Microscopes to Address Industrial Nano-Metrology Needs of Integrated Circuits and Nanoelectronic Devices
Published: 8/25/2014
Author: Joseph J Kopanski
Abstract: , Electrical modes of scanning probe microscopes have found considerable metrology applications in integrated circuits and emerging nano-electronic devices. This paper will review the critical metrology needs that electrical SPMs have addressed in th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915485

3. Microwave-Based Metrology Platform Development: Application of Broad-Band RF Metrology to Integrated Circuit Reliability Analyses
Published: 5/12/2014
Authors: Lin You, Chukwudi Azubuike Okoro, Jungjoon Ahn, Joseph J Kopanski, Yaw S Obeng
Abstract: In this paper we describe the development of a suite of techniques, based on the application of high frequency electromagnetic waves, to probe material and structural changes in integrated circuits under various external perturbations. We discuss how ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915367

4. Scanning Probe Microscopes for Subsurface Imaging
Published: 5/11/2014
Authors: Joseph J Kopanski, Lin You, Jungjoon Ahn, Emily Hitz, Yaw S Obeng
Abstract: Scanning probe microscopes (SPMs) have some ability to image sub-surface structures. This paper describes the theoretical and practical basis for imaging metal lines buried beneath insulating layers and for imaging insulating regions or voids within ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915483

5. DESIGN OF TEST STRUCTURE FOR 3D-STACKED INTEGRATED CIRCUITS (3D-SICS) METROLOGY
Published: 3/25/2014
Authors: Lin You, Jungjoon Ahn, Joseph J Kopanski
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914744

6. Back-End-of-Line Test Structure Design and Simulation for Subsurface Metrology with Scanning Probe Microscopy
Published: 12/13/2013
Authors: Lin You, Emily Hitz, Jungjoon Ahn, Yaw S Obeng, Joseph J Kopanski
Abstract: As demands in the semiconductor industry call for further miniaturization and performance enhancement of electronic systems, the traditional planar (2D) electronic interconnection and packaging technologies show their difficulties in meeting the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915013

7. Contact Potential Measurements on Nano-particle embedded AlGaN/Metal Interface Using Kelvin Force Microscopy
Published: 12/11/2013
Authors: Jungjoon Ahn, Min-Seok Kang, Lin You, Joseph J Kopanski, Sang-Mo Koo
Abstract: AlGaN/GaN Schottky barrier diodes (SBDs) have received much attention for high power and high- frequency applications because of the high breakdown field in the wide band gap semiconductor. Schottky contacts with tunable barrier height (ΦB) b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915012

8. Charge-Based Capacitance Measurements Circuits for Interface With Atomic Force Microscope Probes
Published: 3/25/2013
Authors: Joseph J Kopanski, Muhammad Yaqub Afridi, Chong Jiang, Michael Lorek, Timothy Kohler, Curt A Richter
Abstract: The charge based capacitance measurement (CBCM) technique is highly sensitive to small capacitances and capable integration of onto an AFM tip, thereby reducing stray and wire capacitance to the bare minimum. The CBCM technique has previous been appl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913172

9. Measurement Science for "More-Than-Moore" Technology Reliability Assessments
Published: 10/12/2012
Authors: Chukwudi Azubuike Okoro, Jungjoon Ahn, Meagan V. Kelso, Pavel Kabos, Joseph J Kopanski, Yaw S Obeng
Abstract: In this paper, we will present an overview of metrology issues and some of the techniques currently under development in our group at NIST, aimed at understanding some of the potential performance limiting issues in such highly integrated systems ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911714

10. Metrology for Nanosystems and Nanoelectronics Reliability Assessments
Published: 8/20/2012
Authors: Yaw S Obeng, Chukwudi Azubuike Okoro, Joseph J Kopanski
Abstract: The traditional models and techniques for studying reliability in integrated circuits may not be appropriate for nanoelectronics and nanosystems. In this paper, we present an overview of a number of materials and metrology techniques currently un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911433



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