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Author: william keery
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1. A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published: 11/1/1989
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26670

2. An Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Series: NIST Interagency/Internal Report (NISTIR)
Published: 1/1/1989
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20079

3. Application of Transmission Electron Detection to SCALPEL Mask Metrology
Published: 11/1/1997
Authors: R Farrow, Michael T Postek, William J. Keery, Samuel N Jones, J R. Lowney, M Blakey, L Fetter, J Griffith, J E Liddle, L C Hopkins, H A Huggins, M Peabody,, A Novembre
Abstract: Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820894

4. Application of Trasmission Electron Detection to Scalpel Mask Metrology
Published: 11/1/1997
Authors: R Farrow, Michael T Postek, William J. Keery, Samuel N Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C Hopkins, H A Huggins, M Peabody, A Novembre, J Griffith
Abstract: Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823090

5. Cryopump Vibration Isolation System for an SEM
Published: 12/31/1991
Authors: Michael T Postek, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4348

6. Design and Development of a Measurement and Control System for Measuring SEM Magnification Calibration Samples
Published: 6/1/2002
Authors: Crossley E Jayewardene, William J. Keery, Michael T Postek, Andras Vladar, Bradley N Damazo
Abstract: The National Institute of Standards and Technology (NIST) has provided industry with a scanning electron microscope (SEM) magnification calibration sample Reference Material (RM) 8090. The certified, Standard Reference Material (SRM) version, SRM 209 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821755

7. Development of a Low-Profile High-Efficiency Microchannel-Plate Detector System for SEM Imaging and Metrology
Published: 12/31/1990
Authors: Michael T Postek, William J. Keery, Nolan V. Frederick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2071

8. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 12/31/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28049

9. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 1/1/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, Egon Marx, Robert D. Larrabee
Abstract: This work provides an approach to improved x?ray mask linewidth metrology and a more precise edge location algorithm for measurement of feature sizes on x?ray masks in commercial instrumentation. The transmitted electron detection mode is also useful ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820704

10. Inverse Electron Beam Modeling and Metrology Research
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790