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Author: william keery

Displaying records 21 to 26.
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21. Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry
Published: 12/31/1989
Authors: Michael T Postek, William J. Keery, S. Jones
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=13631

22. Specimen Biasing to Enhance or Suppress Secondary Electron Emission from Charging Specimens at Low Accelerating Voltages
Published: 12/31/1989
Authors: Michael T Postek, William J. Keery, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=5505

23. A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published: 11/1/1989
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26670

24. An Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Series: NIST Interagency/Internal Report (NISTIR)
Published: 1/1/1989
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20079

25. The Relationship Between Accelerating Voltage and Electron Detection Modes to Linewidth Measurement in an SEM
Published: 12/31/1988
Authors: Michael T Postek, William J. Keery, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29772

26. Scanning Electron Microscope Linewidth Measurement Standards Programat the National Bureau of Standards
Published: 12/31/1987
Authors: Michael T Postek, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23904



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