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Author: jay jun

Displaying records 11 to 20 of 24 records.
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11. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822023

12. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models
Published: 7/1/2002
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker, Jay Shi Jun, Egon Marx, Robert D. Larrabee, B Russo, M P Davidson
Abstract: In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821754

13. Comparison of Edge Detection Methods Using a Prototype Overlay Calibration Artifact
Published: 8/1/2001
Authors: Richard M Silver, Jay Shi Jun, Edward A Kornegay, R Morton
Abstract: Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a number of and the parameters which affect those measurements. The samples used in this study ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821588

14. Molecular Measuring Machine Design and Performance
Published: 1/1/2001
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E Clayton Teague
Abstract: We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microsc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821689

15. Overlay Metrology: Recent Advances and Future Solutions
Published: 1/1/2001
Authors: Richard M Silver, Jay Shi Jun, S Fox, Edward A Kornegay
Abstract: As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of features from different photolithographic levels become increasingly important. Improved manufact ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821612

16. Molecular Measuring Machine Design and Measurements
Published: 5/1/2000
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821763

17. Grating Pitch Measurements With the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

18. Toward Nanometer Accuracy Measurements
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820933

19. Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry
Published: 12/31/1993
Authors: E Clayton Teague, Loren W. Linholm, Michael W Cresswell, William B. Penzes, John A Kramar, Fredric Scire, John S Villarrubia, Jay Shi Jun
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2653

20. The Vertical Machining Workstation Systems
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 3890
Published: 7/1/1988
Author: Jay Shi Jun
Abstract: This paper presents an overview of the control systems of the Vertical Machining Workstation (VWS) of the Automated Manufacturing Research Facility (AMRF) at the National Institute of Standards and Technology (NIST). It also gives details of worksta ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821210



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