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You searched on: Author: ronald jones Sorted by: title

Displaying records 1 to 10 of 62 records.
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1. X-Ray Absorption Spectroscopy to Probe Interfacial Issues in Photolithography
Published: 2/1/2003
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A Fischer, S Sambasivan, Eric K Lin, Ronald Leland Jones, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers1. Here we utilize near edge X-ray a ...

2. 3-Dimensional Lineshape Metrology Using Small Angle X-ray Scattering
Published: 9/1/2003
Authors: Ronald Leland Jones, T J Hu, Eric K Lin, Wen-Li Wu, D M Casa, G G Barclay
Abstract: The need for sub-nanometer precision metrology of dense patterns for future technology nodes challenges current methods based on light scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). We provide results of initi ...

3. A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension
Published: 1/28/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of process ...

4. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...

5. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...

6. Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films
Published: 8/18/2009
Authors: Nathaniel J Fredin, Brian Berry, Kevin G. Yager, Alamgir Karim, Sushil K. Satija, Deanna Pickel, Ronald Leland Jones
Abstract: The development of methods that permit control over the long-range order and orientation of microdomains in block copolymer (BCP) thin films for bottom-up approaches to nanoscale surface patterning is of great interest for many applications, includ ...

7. Block Copolymer Ordering With a Spatiotemporally Inhomogeneous Mobility
Published: 11/20/2007
Authors: August W. Bosse, Jack F Douglas, Brian Berry, Ronald Leland Jones, Alamgir Karim
Abstract: Motivated by recent measurements of zone annealing in block copolymer films at low temperatures, we implement a spatiotemporal mobility gradient with intrinsic variations associated with dynamic heterogeneities in the saddle point relaxation of a dib ...

8. Brillouin Scattering Studies of Polymeric Nanostructures
Published: 3/1/2004
Authors: R Hartschuh, A Mahorowala, Y Ding, J H Roh, A Kisliuk, Alexei Sokolov, Christopher L Soles, Ronald Leland Jones, T J Hu, Wen-Li Wu
Abstract: Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In the ...

9. Chain Conformation in Ultrathin Polymer Films
Published: 12/1/2002
Authors: Ronald Leland Jones, Christopher L Soles, Francis W. ~undefined~undefined~undefined~undefined~undefined Starr, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, D L Goldfarb, M Angelopolous
Abstract: Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D < RG,Bulk. Where D is the film thickness and RG,Bulk is the bulk radius of gyr ...

10. Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography
Published: Date unknown
Authors: D M Goldfarb, Eric K Lin, Christopher L Soles, B C Trinque, S D Burns, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G Wilson, Sushil K. Satija, Wen-Li Wu
Abstract: State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high spatial resolution, enabling the fabrication of continually decreasing feature sizes in th ...

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