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Author: ronald jones

Displaying records 51 to 60 of 62 records.
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51. A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension
Published: 1/28/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of process ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852808

52. Combinatorial Methodologies Offer Potential for Rapid Research of Photo-resist Materials and Formulations
Published: 1/1/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853816

53. Structural Characterization of Deep Sub-Micron Lithographic Structures using Small-Angle Neutron Scattering
Published: 1/1/2002
Authors: Eric K Lin, Ronald Leland Jones, Wen-Li Wu, John G Barker, P J Bolton, G G Barclay
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853837

54. Utilizing Near Edge X-ray Absorption Fine Structure to Probe interfacial issues in Photolithography
Published: 1/1/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A Fischer, S Sambasivan, Eric K Lin, Christopher L Soles, Ronald Leland Jones, Wen-Li Wu, D L Goldfarb, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853914

55. Confinement Effects on the Spatial Extent of the Reaction Front in Ultrathin Chemically Amplified Photoresists
Published: 12/1/2001
Authors: D L Goldfarb, M Angelopoulos, Eric K Lin, Ronald Leland Jones, Christopher L Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
Abstract: Sub-100 nm lithography poses strict requirements on photoresist material properties and processing conditions to achieve necessary critical dimension (CD) control of patterned structures. As resist thickness and feature linewidth decrease, fundament ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851937

56. Thin Film Confinement Effects on the Thermal Properties of Model Photoresist Polymers
Published: 12/1/2001
Authors: Christopher L Soles, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: The demand to print increasingly smaller microelectronic device features means that the thickness of the polymer films used in the lithographic processes must decrease. The thickness of these films is rapidly approaching the unperturbed dimensions o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851889

57. Spin-resolved Inverse-Photoemission Study of Ni(001) and its Chemisorption
Published: 11/15/1987
Authors: L Klebanoff, Ronald K. Jones, Daniel Thornton Pierce, Robert Celotta
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620299

58. Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning
Published: Date unknown
Authors: D L Goldfarb, S D Burns, M Angelopolous, S Skordas, R L Burns, M C Lawson, C J Brodsky, V Vishnu, E Jablonski, Vivek M Prabhu, Ronald Leland Jones, B D. Vogt, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that can afford a controlled decrease in resist line edge roughness (LER) or a reduction in def ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852849

59. Both Chain Conformation and Intermolecular Interactions Determine the Rheology of Highly Concentrated Bovine Serum Albumin Solutions
Published: Date unknown
Authors: Prasad Srinivasan Sarangapani, Steven D Hudson, Ronald Leland Jones, Jack F Douglas, Jai Avinash Pathak
Abstract: Several decades of studies of protein solution hydrodynamics/rheology and thermodynamics have reinforced a colloidal view of these ,particles‰: this viewpoint ignores the wide range of conformational states of proteins. Bovine serum albumin (BSA) i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915903

60. Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography
Published: Date unknown
Authors: D M Goldfarb, Eric K Lin, Christopher L Soles, B C Trinque, S D Burns, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G Wilson, Sushil K. Satija, Wen-Li Wu
Abstract: State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high spatial resolution, enabling the fabrication of continually decreasing feature sizes in th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852128



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