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Author: ronald jones

Displaying records 41 to 50 of 62 records.
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41. Incoherent Neutron Scattering and the Dynamics of Thin Film Photoresist Polymers
Published: 2/1/2003
Authors: Christopher Soles, Jack F Douglas, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: Elastic incoherent neutron scattering is employed to parameterize changes in the atomic/molecular mobility in lithographic polymers as a function of film thickness. Changes in the 200 MHz and faster dynamics are estimated in terms of a harmonic osci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852097

42. Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films
Published: 2/1/2003
Authors: Christopher Soles, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, D L Goldfarb, M Angelopoulos
Abstract: A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decrea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852201

43. Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts
Published: 1/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Christopher Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853867

44. Small Angle X-ray Scattering as a Tool for Sub-100 nm Pattern Characterization
Published: 1/1/2003
Authors: Ronald Leland Jones, T Hu, Eric K Lin, Wen-Li Wu, R Kolb, D M Casa, P J Bolton, G G Barclay
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853894

45. Chain Conformation in Ultrathin Polymer Films
Published: 12/1/2002
Authors: Ronald Leland Jones, Christopher Soles, Francis W. ~undefined~undefined~undefined~undefined~undefined Starr, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, D L Goldfarb, M Angelopolous
Abstract: Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D < RG,Bulk. Where D is the film thickness and RG,Bulk is the bulk radius of gyr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852065

46. Measurement of the Spatial Evolution of the Deprotection Reaction Front With Nanometer Resolution Using Neutron Reflectometry
Published: 12/1/2002
Authors: Eric K Lin, Sushil K. Satija, Wen-Li Wu, Christopher Soles, D L Goldfarb, B C Trinque, S D Burns, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G Willson
Abstract: The use of chemically amplified photoresists for the fabrication of sub-100 nm features will require spatial control with nanometer level resolution. To reach this goal, a detailed understanding of the complex reaction-diffusion mechanisms at these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852040

47. Reaction Front Induced Roughness in Chemically Amplified Photoresists
Published: 8/1/2002
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxysty ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852008

48. Direct Measurement of the Reaction Front in Chemically Amplified Photoresists
Published: 7/1/2002
Authors: Eric K Lin, Sushil K. Satija, Wen-Li Wu, Christopher Soles, D L Goldfarb, B C Trinque, S D Burns, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G Willson
Abstract: The continuing drive by the semiconductor industry to fabricate smaller structures with photolithography will soon require dimensional control at length scales, (2 to 5) nm, comparable to the size of the polymeric molecules in the materials used to p ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852012

49. Probing Surface and Bulk Chemistry in Resist Films Using Near Edge X-Ray Absorption Fine Structure
Published: 5/1/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher Soles, Wen-Li Wu, Daniel A Fischer, S Sambasivan, D L Goldfarb, M Angelopoulos
Abstract: Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers. One focus of our research is ident ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852004

50. Controlling Morphology During Pattern Development in Thin Film Photoresists
Published: 2/1/2002
Authors: Ronald Leland Jones, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu
Abstract: We report on attempts to control surface morphology using current lithographic processes critical to the development of both inorganic and organic nano-structures. Bilayers of protected (base insoluble) and deprotected (base soluble) model lithograp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851990



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