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Author: ulf griesmann

Displaying records 41 to 50 of 52 records.
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41. New Energy Levels and Classifications of Spectral Lines From Neutral and Singly-Ionized Dysprosium (Dy I and Dy II)
Published: 12/1/2000
Authors: Gillian Nave, Ulf Griesmann
Abstract: We present over 4000 new energy-level classifications in the spectra of neutral and singly ionized dysprosium. These lines were observed using Fourier transform spectrometry of high current hollow cathode lamps, and cover the wavelength range 23 nm t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840424

42. Accurate Transition Rates for the 5p-5s Transitions in Kr I
Published: 8/1/2000
Authors: Krzysztof Dzierzega, U Volz, Gillian Nave, Ulf Griesmann
Abstract: Branching fractions were measured for electric dipole transitions for the 5p upper levels to the 5s levels in neutral Krypton atoms. The measurements were made with a wall-stabilized electric arc for the spectral lines in the visible, and with a hol ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840401

43. Interferometric Measurement of Resonance Transition Wavelengths in CIV, SiIV, AlIII, Al II, and SiII
Published: 6/1/2000
Authors: Ulf Griesmann, R Kling
Abstract: The wavelength of the important ultraviolet diagnostic lines in the spectra C IV near 155 nm and Si IV near 139 nm were measured with a vacuum ultraviolet Fourier transform spectrometer and a high-current Penning discharge source. Our measurement als ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840425

44. Accurate f-Values for Ultraviolet Transitions From the 3d^u5^ (^u6^S) 4p Levels in Mn II
Published: 3/1/2000
Authors: R Kling, Ulf Griesmann
Abstract: We have measured branching fractions for ultraviolet electric dipole transitions from upper levels belonging to the 3d^u5^(^u6^S)4p^u5^P and 3d^u5^ (^u6^S)4p^u7^P terms of Mn II. The levels were excited in a hollow cathode lamp and the spectra were ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840356

45. Refractivity of Nitrogen Gas in the Vacuum Ultraviolet
Published: 12/1/1999
Authors: Ulf Griesmann, John H. Burnett
Abstract: We have measured the refractivity of nitrogen gas in the ultraviolet and vacuum ultraviolet using a Fourier transform spectrometer. A new two-term Sellmeier formula for the standard refractivity between 145 nm and 270 nm is derived.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840379

46. Absolute Refractive Indices and Thermal Coefficients of Fused Silica and Calcium Fluoride Near 193 nm
Published: 9/1/1998
Authors: John H. Burnett, Ulf Griesmann, M Walhout, J L Dehmer, J R Roberts, R Gupta
Abstract: The refractive indices of several fused silica and calcium fluoride samples from different suppliers were measured with the minimum deviation method in the deep UV between 191 and 196 nm with a standard uncertainty of 7 ppm. For both materials the d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840308

47. Atomic Oscillator Strengths in the Vacuum Ultraviolet using Fourier Transform and Grating Spectroscopy
Published: Date unknown
Authors: Gillian Nave, Zhigang Li, Craig J Sansonetti, Ulf Griesmann, Alexander Fried
Abstract: We describe our program to measure branching fractions of Fe II in the vacuum ultraviolet. Branching ratios above 1400 are measured using Fourier transform spectroscopy of hollow cathode and Penning discharge sources. The spectra are radiometrica ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840773

48. Index of Retraction and its Temperature Dependence of Calcium Fluoride Near 157nm
Published: Date unknown
Authors: John H. Burnett, Ulf Griesmann, R Gupta, T E Jou
Abstract: We have made accurate measurements near 157 nm of the relative index of refraction, its dispersion, and its temperature dependence for two grades of calcium fluoride in N^d2^ gas. Accurate measurements of the quantitites are needed for the design of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840357

49. Manufacture of Extremely Flat 300 mm Silicon Wafers
Published: Date unknown
Authors: Marc Tricard, Paul Dumas, Christopher Hall, Ulf Griesmann, Quandou Wang
Abstract: The flatness requirement for silicon wafers at the exposure site will be lower than 50 nm by 2010 and may be as low as 25nm by 2015 (TRS 2005).  This creates new challenges for both wafer polishing and metrology tools capable of meeting the spec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823340

50. Measurements of Refraction in the Deep and Vacuum Ultraviolet Uusing the Minimum Deviation Method
Published: Date unknown
Authors: John H. Burnett, R Gupta, Ulf Griesmann
Abstract: We discuss a procedure to make accurate measurements of the index of refraction, its dispersion, and its temperature dependence, in the deep ultraviolet (near 193 nm), using precision goniometric spectrometers and the minimum deviation method. Measur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840329



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