NIST logo

Publications Portal

You searched on:
Author: ulf griesmann

Displaying records 11 to 20 of 49 records.
Resort by: Date / Title

11. A Toolbox for Designing and Analyzing Phase-Shifting Interferometry Algorithms with Characteristic Polynomials
Published: 6/13/2010
Author: Ulf Griesmann
Abstract: Many of the recent advances in understanding of phase-shifting algorithms have yet to be incorporated into the software for commercial phase shifting interferometers. A toolbox, for the open-source computer algebra system Maxima, simplifies analysis ...

12. Power Spectral Density: Is it right?
Published: 6/13/2010
Authors: Ulf Griesmann, John Lehan, Jiyoung Chu
Abstract: We concentrate on the instrumental issues surrounding power spectral density (PSD) determination, using as an example, the most common optical shop QA tool, the Fizeau interferometer. We briefly discuss the properties of an ideal calibration method ...

13. Deformation-Free Form Error Measurements of Thin, Plane-Parallel Optics Floated on a Heavy Liquid
Published: 4/1/2010
Authors: JiYoung Chu, Ulf Griesmann, Quandou Wang, Johannes A Soons, Eric C Benck
Abstract: We describe a novel method for measuring the unconstrained flatness error of thin, plane parallel precision optics by floating them on high-density aqueous metatungstate solutions while measuring the flatness error with an interferometer. The supp ...

14. Computer-Generated Hologram Cavity Interferometry Test for Large X-Ray Mandrels: Design
Published: 6/1/2009
Authors: Guangjun Gao, John P. Lehan, William W. Zhang, Ulf Griesmann, Johannes A Soons
Abstract: A glancing incidence interferometric test for large x-ray mirror mandrels, using two computer generated holograms (CGH s), is described. The two CGH s are used to form a double pass glancing incidence system. One layout of the CGH-cavity glancing in ...

15. Radius Measurement of Spherical Surfaces With Large Radii-of-Curvature Using Dual-Focus Zone Plates
Published: 10/20/2008
Authors: Quandou Wang, Guangjun Gao, Ulf Griesmann
Abstract: The measurement of spherical surface radii exceeding a few meters presents a challenge, because the familiar radius-bench method requires large part displacements. Dual-focus zone plates can extend the radius-bench method to measurements of large rad ...

16. Measuring the Phase Transfer Function of a Phase-Shifting Interferometer
Published: 8/13/2008
Authors: JiYoung Chu, Quandou Wang, John P. Lehan, Ulf Griesmann, Guangjun Gao
Abstract: In characterizing the performance of a phase-shifting interferometer, the dependence of the measured height on the spatial frequency is rarely considered. We describe a test mirror with a special height relief that can be used to measure the height t ...

17. Stationary and non-stationary deformations in three-flat tests
Published: 7/7/2008
Authors: Ulf Griesmann, Quandou Wang, Nicolas Laurenchet, Johannes A Soons
Abstract: Calibration procedures for optical reference flats of phase-shifting interferometers (three-flat tests) are critically important if flatness measurements with low uncertainty are desired. In these tests, all combinations of three flats with unknown f ...

18. Dual-CGH Interferometry Test for X-Ray Mirror Mandrels
Published: 6/15/2008
Authors: Guangjun Gao, John Lehan, Ulf Griesmann
Abstract: We describe a glancing-incidence interferometric double-pass test, based on a pair of computer generated holograms (CGHs), for mandrels used to fabricate x-ray mirrors for space-based x-ray telescopes. The design of the test and its realization are d ...

19. Three-Flat Test Solutions Including Mounting-Induced Deformations
Published: 9/1/2007
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons
Abstract: We investigate three-flat calibration methods for circular flats, based on rotation symmetry and mirror symmetry, for absolute interferometric flatness measurements in the presence of deformations caused by the support mechanism for the flats, which ...

20. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...

Search NIST-wide:

(Search abstract and keywords)

Last Name:
First Name:

Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series