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Author: martin green
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1. A Combinatorial Study of Metal Gate/HfO2 MOSCAPS
Published: 9/1/2006
Authors: Martin L Green, K S Chang, Ichiro Takeuchi, T Chikyow
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854327

2. A Combinatorial Study of Metal Gate/HfO2-MOSCAPS
Published: Date unknown
Authors: Martin L Green, Kao-Shuo Chang, Ichiro Takeuchi, T Chikyow
Abstract: Combinatorial methodology is a rapid technique for surveying new gate dielectrics and gate metal electrodes for the very complex advanced CMOS gate stack. Here, we report on a typical metal gate electrode alloy system, the Ni-Ti-Pt ternary. We have ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850984

3. A High-Throughput Thermoelectric Power-Factor Screening Tool for Rapid Construction of Thermoelectric Property Diagrams
Published: 1/23/2007
Authors: Makoto Otani, Nathan Lowhorn, Peter K. Schenck, Winnie K Wong-Ng, Martin L Green, K Itaka, H Koinuma
Abstract: We have developed a high throughput screening tool that maps out thermoelectric power factors of combinatorial composition-spread film libraries. The screening tool allows us to measure the electrical conductivity and Seebeck coefficient of over 1000 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851068

4. A High-throughput Screening System for Thermoelectric Material Exploration Based on Combinatorial Film Approach
Published: 5/7/2009
Authors: Makoto Otani, Evan L. Thomas, Winnie K Wong-Ng, Peter K. Schenck, Nathan Lowhorn, Martin L Green, Hiroyuki Ohguchi
Abstract: A high-throughput system that consists of a combinatorial tool (a sputtering deposition tool and a pulsed laser deposition tool) and two property screening devices, developed at NIST, was used for thermoelectric material exploration. The thermoelectr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854167

5. A high-throughput thermoelectric power-factor screening tool for rapid construction of thermoelectric property diagrams
Published: 9/24/2007
Authors: Makoto Otani, N D Lowhorn, Peter K. Schenck, Winnie K Wong-Ng, Martin L Green, K Itaka, H Koinuma
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854387

6. Annealing Behavior of Atomic Layer Deposited HfO2 Films Studied by Synchrotron X-Ray Reflectivity and Grazing Incidence Small Angle Scattering
Published: 6/30/2009
Authors: Martin L Green, Andrew John Allen, J. L. Jordan-Sweet, Jan Ilavsky
Abstract: New results are presented for the annealing behavior of ultrathin complementary-metal-gate-semiconductor (CMOS) gate-dielectric (high-) HfO2 films grown by atomic layer deposition (ALD). A series of ALD HfO2 dielectric films has been stu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854475

7. Close Proximity Self-Aligned Shadow Mask for Sputter Deposition Onto a Membrane or Cavity
Published: 5/5/2008
Authors: Ravi Kummamuru, L Hu, Lawrence P. Cook, M Y Efremov, E A Olson, Martin L Green, L H Allen
Abstract: In this paper we report fabrication of a shadow mask designed for sputtering into cavities or on the back surface of freestanding silicon nitride (SiNx) membranes. Sputter deposition through a shadow mask typically results in spreading of the deposit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853574

8. Combinatorial Methodology for the Exploration of Metal Gate Electrodes on HfO^d2^ for the Advanced Gate Stack
Published: 1/23/2008
Authors: Kao-Shuo Chang, Martin L Green, John S Suehle, Jason Hattrick-Simpers, Ichiro Takeuchi, K Ohmori, T Chikyow, S De Gendt, Prashant Majhi
Abstract: Combinatorial methodology offers an efficient platform to accelerate the exploration of new materials. We demonstrate the effectiveness of this technique on the study of new metal gates for the advanced gate stack. We report two examples, Ni-Ti-Pt te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853566

9. Combinatorial Study of Ni-Ti-Pt Ternary Metal Gate Electrodes on HfO2 for the Advanced Gate Stack
Published: 10/2/2006
Authors: K S Chang, Martin L Green, John S Suehle, Eckhard Vogel, Hao Xiong, Jason Hattrick-Simpers, Ichiro Takeuchi, O Famodu, K Ohmori, P Ahmet, T Chikyow, Prashant Majhi, B -H Lee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854309

10. Combinatorial Study of Ni-Ti-Pt Ternary Metal Gate Electrodes on HfO^d2^ for the Advanced Gate Stack
Published: 10/2/2006
Authors: Kao-Shuo Chang, Martin L Green, John S Suehle, Eric M. Vogel, Hao Xiong, Jason Hattrick-Simpers, Ichiro Takeuchi, O Famodu, K Ohnaka, T Chikyow, Prashant Majhi, B H Lee, M Gardner
Abstract: We have fabricated combinatorial Ni-Ti-Pt ternary metal gate thin film libraries on HfO2 using magnetron co-sputtering, to investigate flat-band voltage shift (DVfb) and leakage current density (JL) variations. Wavelength dispersive spectroscopy (WDS ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850953



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