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Author: steven grantham

Displaying records 41 to 49.
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41. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

42. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547

43. Mass absorption coefficient of tungsten for 1600-2100 eV
Published: 1/1/2002
Authors: Zachary H Levine, Steven E Grantham, I McNulty
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101602

44. Accurate pattern registration for integrated circuit tomography
Published: 1/1/2001
Authors: Zachary H Levine, Steven E Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Ying-ju Wang, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101603

45. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101762

46. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

47. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840260

48. Multilayers for Next Generation X-Ray Sources
Published: Date unknown
Authors: S Bajt, H N Chapman, E Spiller, S Hau-Riege, J Alameda, A J Nelson, C C Walton, B Kjornrattanawanich, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840269

49. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840225



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