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Author: steven grantham

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41. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: Date unknown
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

42. Metrology for EUV Lithography Sources and Tools
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840201

43. Multilayers for Next Generation X-Ray Sources
Published: Date unknown
Authors: S Bajt, H N Chapman, E Spiller, S Hau-Riege, J Alameda, A J Nelson, C C Walton, B Kjornrattanawanich, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840269

44. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840225



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