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You searched on: Author: steven grantham

Displaying records 41 to 50 of 51 records.
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41. Parallax measurements of integrated circuit interconnects using a scanning transmission electron microscope
Published: 1/1/2003
Authors: Zachary H Levine, J J Gao, S Neogi, T M Levin, J H Scott, Steven E Grantham

42. Response of a silicon photodiode to pulsed radiation,
Published: 1/1/2003
Authors: Robert Edward Vest, Steven E Grantham

43. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto

44. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto

45. Mass absorption coefficient of tungsten for 1600-2100 eV
Published: 1/1/2002
Authors: Zachary H Levine, Steven E Grantham, I McNulty

46. Accurate pattern registration for integrated circuit tomography
Published: 1/1/2001
Authors: Zachary H Levine, Steven E Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Ying-ju Wang, Thomas B Lucatorto

47. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, Thomas B Lucatorto

48. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...

49. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...

50. Multilayers for Next Generation X-Ray Sources
Published: Date unknown
Authors: S Bajt, H N Chapman, E Spiller, S Hau-Riege, J Alameda, A J Nelson, C C Walton, B Kjornrattanawanich, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons ...

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