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Author: steven grantham

Displaying records 31 to 40 of 44 records.
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31. Parallax measurements of integrated circuit interconnects using a scanning transmission electron microscope
Published: 1/1/2003
Authors: Zachary H Levine, J J Gao, S Neogi, T M Levin, J H Scott, Steven Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101600

32. Response of a silicon photodiode to pulsed radiation,
Published: 1/1/2003
Authors: Robert Edward Vest, Steven Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101786

33. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S. Tarrio, Steven Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

34. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven Grantham, Charles S. Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547

35. Mass absorption coefficient of tungsten for 1600-2100 eV
Published: 1/1/2002
Authors: Zachary H Levine, Steven Grantham, I McNulty
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101602

36. Accurate pattern registration for integrated circuit tomography
Published: 1/1/2001
Authors: Zachary H Levine, Steven Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Ying-ju Wang, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101603

37. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S. Tarrio, Robert Edward Vest, Steven Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101762

38. At-Wavelength Metrology for EUV Lithography at NIST
Published: Date unknown
Authors: Charles S. Tarrio, Steven Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

39. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S. Tarrio, Yaniv Barad, Steven Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

40. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S. Tarrio, Steven Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840260