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Author: steven grantham

Displaying records 11 to 20 of 49 records.
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11. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901663

12. A Low Cost Fiducial Reference for Computed Tomography
Published: 11/11/2008
Authors: Zachary H Levine, Steven E Grantham, Daniel S Sawyer, Anthony P Reeves, David F Yankelevitz
Abstract: Rationale and Objectives. To detect the growth in lesions, it is necessary to ensure that the apparent changes in size are above the noise floor of the system. By introducing a fiducial reference, it may be possible to detect smaller changes in le ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842437

13. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842436

14. Metrology for EUV Lithography Sources and Tools
Published: 7/3/2006
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840201

15. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

16. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101650

17. NIST VUV Metrology Programs to Support Space Based Research,
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101784

18. NIST VUV metrology programs to support space-based research
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104243

19. Saturation effects in solid state photodiodes and impact on EUVL pulse energy measurements,
Published: 1/1/2006
Authors: Robert Edward Vest, Shannon Bradley Hill, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101785

20. Synchrotron Beamline for Extreme-Ultraviolet Multilayer Mirror Endurance Testing
Published: 5/1/2005
Authors: Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840203



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