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Author: thomas germer

Displaying records 141 to 150 of 164 records.
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141. Application of Bidirectional Ellipsometry to the Characterization of Roughness and Defects in Dielectric Layers
Published: 4/1/1998
Author: Thomas Avery Germer
Abstract: The polarization of light scattered into directions out of the plane of incidence is calculated for microroughness, defects, or particles in or near a dielectric film on a substrate. The theories for microroughness and Rayleigh scatter in the presen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841269

142. Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection
Published: 3/1/1998
Author: Thomas Avery Germer
Abstract: In this paper, I will discuss the theory and application of polarized light scatter. Recent measurements have shown that some sources of scatter, including microroughness and subsurface defects, have well-defined polarizations for any specific pair ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841276

143. Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, ed. by J. C. Stover
Published: 1/1/1998
Author: Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104498

144. Display Reflectance Model Based on the BRDF
Published: 1/1/1998
Authors: E F Kelley, G R Jones, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103932

145. Polarization of out-of-plane optical scatter from SiO^d2^ films grown on photolithographically-generated microrough silicon, ed. by Z.H. Gu and A.A. Maradudin
Published: 1/1/1998
Authors: Thomas Avery Germer, B W Scheer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104497

146. Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection
Published: 1/1/1998
Authors: Thomas Avery Germer, D G Seiler, W M Bullis, A C Diebold, R Mcdonald, T J Shaffner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104499

147. SFRF: Spatial Frequency Response Function Estimation Program
Published: 11/10/1997
Authors: Thomas Avery Germer, Clara C. Asmail
Abstract: Measurements of optical scatter are often employed in production line diagnostics for surface roughness of silicon wafers. However, the geometry of the optical scatter instrumentation lacks universal standardization, making it difficult to compare v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841230

148. Scattering From Sinusoidal Gratings
Published: 9/1/1997
Authors: B C. Park, Theodore Vincent Vorburger, Thomas Avery Germer, Egon Marx
Abstract: Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820855

149. A Goniometric Optical Scatter Instrument for Bidirectional Reflectance Distribution Function Measurements with Out-of-plane and Polarimetry Capabilities, ed. by Z.H. Gu and A.A. Maradudin
Published: 1/1/1997
Authors: Thomas Avery Germer, Clara C. Asmail
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104502

150. Angular Dependence and Polarization of Out-of-plane Optical Scattering from Particulate Contamination, Subsurface Defects, and Surface Microroughness
Published: 1/1/1997
Author: Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104500



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