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You searched on: Author: thomas germer

Displaying records 141 to 150 of 165 records.
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141. Display Reflectance Model Based on the BRDF
Published: 6/1/1998
Authors: Edward F. Kelley, George R Jones, Thomas Avery Germer
Abstract: Many flat panel displays (FPDs) permit anti-reflection surface treatments that differ in character from those of traditional cathode-ray-tube displays. Specular reflection models (mirror-like, producing a distinct image) combined with diffuse (Lambe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24685

142. Application of Bidirectional Ellipsometry to the Characterization of Roughness and Defects in Dielectric Layers
Published: 4/1/1998
Author: Thomas Avery Germer
Abstract: The polarization of light scattered into directions out of the plane of incidence is calculated for microroughness, defects, or particles in or near a dielectric film on a substrate. The theories for microroughness and Rayleigh scatter in the presen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841269

143. Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection
Published: 3/1/1998
Author: Thomas Avery Germer
Abstract: In this paper, I will discuss the theory and application of polarized light scatter. Recent measurements have shown that some sources of scatter, including microroughness and subsurface defects, have well-defined polarizations for any specific pair ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841276

144. Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, ed. by J. C. Stover
Published: 1/1/1998
Author: Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104498

145. Display Reflectance Model Based on the BRDF
Published: 1/1/1998
Authors: E F Kelley, G R Jones, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103932

146. Polarization of out-of-plane optical scatter from SiO^d2^ films grown on photolithographically-generated microrough silicon, ed. by Z.H. Gu and A.A. Maradudin
Published: 1/1/1998
Authors: Thomas Avery Germer, B W Scheer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104497

147. Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection
Published: 1/1/1998
Authors: Thomas Avery Germer, D G Seiler, W M Bullis, A C Diebold, R Mcdonald, T J Shaffner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104499

148. SFRF: Spatial Frequency Response Function Estimation Program
Published: 11/10/1997
Authors: Thomas Avery Germer, Clara C. Asmail
Abstract: Measurements of optical scatter are often employed in production line diagnostics for surface roughness of silicon wafers. However, the geometry of the optical scatter instrumentation lacks universal standardization, making it difficult to compare v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841230

149. Scattering From Sinusoidal Gratings
Published: 9/1/1997
Authors: B C. Park, Theodore Vincent Vorburger, Thomas Avery Germer, Egon Marx
Abstract: Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820855

150. A Goniometric Optical Scatter Instrument for Bidirectional Reflectance Distribution Function Measurements with Out-of-plane and Polarimetry Capabilities, ed. by Z.H. Gu and A.A. Maradudin
Published: 1/1/1997
Authors: Thomas Avery Germer, Clara C. Asmail
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104502



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