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Author: joseph fu

Displaying records 51 to 60 of 72 records.
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51. Improving Pitch and Step Height Measurements Using the Calibrated Atomic Force Microscope
Published: 11/1/1998
Authors: R Koning, Ronald G Dixson, Joseph Fu, V W. Tsai
Abstract: No abstract.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823080

52. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820909

53. Measurement of Pitch and Width Samples with the NIST Calibrated Atomic Force Microscope
Published: 6/1/1998
Authors: Ronald G Dixson, R Koning, Theodore Vincent Vorburger, Joseph Fu, V W. Tsai
Abstract: Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820889

54. Improving Step Height and Pitch Measurements Using the Calibrated Atomic Force Microscope
Published: 1/1/1998
Authors: R Koning, Ronald G Dixson, Joseph Fu, V W. Tsai, Theodore Vincent Vorburger
Abstract: The most important industrial application of Atomic Force Microscopy (AFM) is probably the accurate measurement of geometrical dimensions of small surface structures. In order to maintain the instrument''s performance and to achieve the high accuracy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820898

55. Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated Atomic Force Microscope
Published: 1/1/1998
Authors: Ronald G Dixson, V W. Tsai, Theodore Vincent Vorburger, Edwin Ross Williams, X Wang, Joseph Fu, R Koning
Abstract: The presence of the atomic force microscope (AFM) in the industrial metrology setting is rapidly increasing. Properties commonly measured in such applications are: feature spacing (pitch), feature height (or depth), feature width (critical dimension) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820838

56. Performing Measurements of Surface Structures With the Calibrated Atomic Force Microscope
Published: 1/1/1998
Authors: R Koning, Ronald G Dixson, Joseph Fu, V W. Tsai, Theodore Vincent Vorburger
Abstract: The use of the atomic force microscope (AFM) to characterize surface structures for industrial applications is rapidly increasing.  To compare the results obtained by different instruments and to achieve high accuracy, the scales of an AFM must ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823087

57. Scanning Electron Microscope Length Standards (Chapter VII in: Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology, R.M. Silver, J.L. Land, Editors, NISTIR 6036)
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Published: 1/1/1998
Authors: Michael T Postek, Joseph Fu
Abstract: A cross-section of length measurement capabilities fiom the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against those of other leading National Measurement Institutes. We present a variety ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820863

58. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST
Published: 1/1/1998
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, E. C. Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823099

59. Accurate Force Measurements for Miniature Mechanical Systems: A Review of Progress
Published: 9/1/1997
Authors: Lowell P. Howard, Joseph Fu
Abstract: A survey of nanonewton force calibration techniques suitable for micro-electromechanical systems (MEMS) is presented. The reviewed techniques include: mass-derived force, pendulums, calibrated master spings, resonance and electromagnetic techniques. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820844

60. Finish and Figure Metrology for Soft X­ray Optics
Published: 1/1/1997
Authors: Theodore Vincent Vorburger, Christopher J. Evans, V W. Tsai, Joseph Fu, E. C. Williams, Ronald G Dixson, P Sullivan, T. McWaid
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901981



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