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Author: michael fasolka
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1. A Robust and High-Throughput Measurement Platform for Monomer Reactivity Ratios from Surface-Initiated Polymerization
Published: 2/23/2012
Authors: Kirt Anthony Page, Derek Patton, Emily Hoff, Michael J Fasolka, Kathryn L Beers
Abstract: This article describes a robust approach to measure monomer reactivity ratios from surface-initiated copolymerization, by measuring composition of statistical copolymer brush surfaces using x-ray photoelectron spectroscopy. Statistical copolymer br ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910460

2. A Versatile Platform for Creating Gradient Combinatorial Libraries via Controlled Light Exposure
Published: 1/1/2007
Authors: Brian Berry, Christopher M Stafford, Mayur Pradip Pandya, Leah A. Lucas, Michael J Fasolka
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854023

3. A Versatile Platform for Creating Gradient Combinatorial Libraries via Modulated Light Exposure
Published: 7/10/2007
Authors: Brian Berry, Christopher M Stafford, Mayur Pradip Pandya, Leah A. Lucas, Michael J Fasolka
Abstract: Combinatorial approaches require the high throughput design and characterization of appropriate well-behaved libraries. This paper details the design, construction and operation of a system that modulates light exposure for the purpose of fabricatin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852706

4. A microfluidic platform for integrated synthesis and dynamic light scattering measurement of block copolymer micelles
Published: 5/1/2008
Authors: Thomas Q. Chastek, Kazunori Iida, Michael J Fasolka, Eric J. Amis, Kathryn L Beers
Abstract: Synthesis of structured polymers is a highly active research area, whose main goal is to make polymers with useful properties for important applications.1 Ideally, therefore, polymer synthesis and materials characterization would be associated as clo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852754

5. Advanced Techniques for Nanocharacterization of Polymeric Coating Surfaces
Published: 1/1/2004
Authors: X H Gu, T Y Wu, Tinh Nguyen, Li Piin Sung, Mark R VanLandingham, Michael J Fasolka, Jonathan W. (Jonathan W.) Martin, Y C Jean, D Nguyen, N K Chang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853954

6. An Informatics Infrastructure for Combinatorial and High-throughput Materials Research Built on Open Source Code
Published: 1/1/2005
Authors: Weiping Zhang, Michael J Fasolka, Alamgir Karim, Eric J. Amis
Abstract: Laboratory Research Informatics Systems (LRIS) hold great promise in streamlining research generally, and are particularly necessary for new data-intensive research strategies such as combinatorial and high-throughput approaches. In this paper, we d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852365

7. An Open Source Informatics System for Combinatorial Materials Research
Published: 3/1/2004
Authors: Weiping Zhang, Michael J Fasolka, Alamgir Karim, Eric J. Amis
Abstract: Laboratory Research Informatics Systems (LRIS) hold great promise in streamlining research generally, and are particularly necessary for new data-intensive research strategies such as combinatorial and high-throughput approaches. In this talk, we des ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852283

8. Block Copolymer Thin Films: Physics and Applications
Published: 2/15/2001
Authors: Michael J Fasolka, A M Mayes
Abstract: A two-part review of research concerning block copolymer thin films is presented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces that govern film morpholog ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841503

9. Characterizing Surface Roughness of Thin Films by Polarized Light Scattering
Published: 11/1/2003
Authors: Thomas Avery Germer, Michael J Fasolka
Abstract: The polarization of light scattered by the surface of a material contains information that can be used to identify the sources of that scatter. In this paper, first order vector perturbation theory for light scattering from interfacial roughness of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841994

10. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852278



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