NIST logo

Publications Portal

You searched on:
Author: ronald dixson

Displaying records 81 to 90 of 114 records.
Resort by: Date / Title


81. Implementation of a Reference Measurement System Using CD-AFM
Published: 5/1/2003
Authors: Ronald G Dixson, Theodore Vincent Vorburger, Angela Guerry, Marylyn H. Bennett, B Bunday
Abstract: International SEMATECH (ISMT) and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of atomic force microscope (AFM) dimensional metrology in semiconductor manufacturing. The rapid pace of tech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821967

82. Characterizing CDSEM Metrology of 193 nm Resists at Ultra Low Voltage
Published: 1/1/2002
Authors: N. Sullivan, M Mastovich, Ronald G Dixson, P Knutruda, B Bunday, P Febrea, R Brandoma
Abstract: Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists.  Total uncertainties, which approach 10 nm, can be realized through the combination of across wafer variation of line ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821957

83. Toward Traceability for At Line AFM Dimensional Metrology
Published: 1/1/2002
Authors: Ronald G Dixson, Angela Guerry, Marylyn H. Bennett, Theodore Vincent Vorburger, Michael T Postek
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability--below 1 nm in some cases. Accuracy, however, is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823148

84. Manufacturing of Prostheses
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6791
Published: 9/1/2001
Authors: Matthew A. Davies, Ronald G Dixson
Abstract: This paper is a summary of a workshop session during the Workshop on Biomedical Materials and Devices, held June 13 -14, 2001. The workshop is part of a series of workshops and topical meetings organized by NIST in the area of biomedical technology. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821858

85. Silicon Single Atom Steps as AFM Height Standards
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821579

86. Atomic Level Surface Metrology
Published: 1/1/2001
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Jun-Feng Song, Thomas B Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
Abstract: MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness ~ 0.1 nmSilicon gate oxides with thickness ~ 3 nm,rms roughness must be sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823146

87. Linewidth Intercomparison on a Polysilicon Sample
Published: 11/1/2000
Authors: John S Villarrubia, Andras Vladar, Michael T Postek, Ronald G Dixson
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821574

88. Accurate Dimensional Metrology With Atomic Force Microscopy
Published: 6/1/2000
Authors: Ronald G Dixson, R Koning, Joseph Fu, Theodore Vincent Vorburger, Thomas B Renegar
Abstract: Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as tools for sub-micrometer dimensional metrology. Measurements commonly performed with AFMs a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820959

89. Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: 1/1/2000
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek
Abstract: Abstract unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820988

90. Interferometric Calibration of a Capacitance Displacement Sensor Over Short Displacement Ranges
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, G S Peng, Theodore Vincent Vorburger
Abstract: Capacitance displacement sensors, which are widely used to measure and control the true extension of piezoelectric actuators, have to be calibrated, if they are to be used for measurement purposes. We have investigated the calibration of a capacitanc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820964



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series