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Author: ronald dixson

Displaying records 81 to 90 of 114 records.
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81. Implementation of a Reference Measurement System Using CD-AFM
Published: 5/1/2003
Authors: Ronald G Dixson, Theodore Vincent Vorburger, Angela Guerry, Marylyn H. Bennett, B Bunday
Abstract: International SEMATECH (ISMT) and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of atomic force microscope (AFM) dimensional metrology in semiconductor manufacturing. The rapid pace of tech ...

82. Characterizing CDSEM Metrology of 193 nm Resists at Ultra Low Voltage
Published: 1/1/2002
Authors: N. Sullivan, M Mastovich, Ronald G Dixson, P Knutruda, B Bunday, P Febrea, R Brandoma
Abstract: Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists.  Total uncertainties, which approach 10 nm, can be realized through the combination of across wafer variation of line ...

83. Toward Traceability for At Line AFM Dimensional Metrology
Published: 1/1/2002
Authors: Ronald G Dixson, Angela Guerry, Marylyn H. Bennett, Theodore Vincent Vorburger, Michael T Postek
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability--below 1 nm in some cases. Accuracy, however, is ...

84. Manufacturing of Prostheses
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6791
Published: 9/1/2001
Authors: Matthew A. Davies, Ronald G Dixson
Abstract: This paper is a summary of a workshop session during the Workshop on Biomedical Materials and Devices, held June 13 -14, 2001. The workshop is part of a series of workshops and topical meetings organized by NIST in the area of biomedical technology. ...

85. Silicon Single Atom Steps as AFM Height Standards
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...

86. Atomic Level Surface Metrology
Published: 1/1/2001
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Jun-Feng Song, Thomas B Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
Abstract: MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness ~ 0.1 nmSilicon gate oxides with thickness ~ 3 nm,rms roughness must be sign ...

87. Linewidth Intercomparison on a Polysilicon Sample
Published: 11/1/2000
Authors: John S Villarrubia, Andras Vladar, Michael T Postek, Ronald G Dixson
Abstract: Not available.

88. Accurate Dimensional Metrology With Atomic Force Microscopy
Published: 6/1/2000
Authors: Ronald G Dixson, R Koning, Joseph Fu, Theodore Vincent Vorburger, Thomas B Renegar
Abstract: Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as tools for sub-micrometer dimensional metrology. Measurements commonly performed with AFMs a ...

89. Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: 1/1/2000
Authors: John S Villarrubia, Ronald G Dixson, Samuel N Jones, J R. Lowney, Michael T Postek
Abstract: Abstract unavailable.

90. Interferometric Calibration of a Capacitance Displacement Sensor Over Short Displacement Ranges
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, G S Peng, Theodore Vincent Vorburger
Abstract: Capacitance displacement sensors, which are widely used to measure and control the true extension of piezoelectric actuators, have to be calibrated, if they are to be used for measurement purposes. We have investigated the calibration of a capacitanc ...

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