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Author: ronald dixson

Displaying records 31 to 40 of 113 records.
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31. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) ‹ a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab ‹ a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187

32. Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks
Published: 2/19/2009
Authors: Stewart Smith, Andreas Tsiamis, Martin McCallum, Andrew Hourd, J Stevenson, Anthony Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W Cresswell, Ndubuisi George Orji
Abstract: This paper compares electrical, optical, and atomic force microscope (AFM) measurements of critical dimension (CD)made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the above ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901862

33. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

34. International photomask linewidth comparison by NIST and PTB
Published: 10/17/2008
Authors: James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824713

35. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824724

36. Accuracy Considerations for Critical Dimension Semiconductor Metrology
Published: 9/9/2008
Authors: Ronald G Dixson, Ndubuisi George Orji, B Bunday, J Allgair
Abstract: As the size of integrated circuit features continues to decrease, the accuracy of measurements becomes more important. Due to greater emphasis on precision rather than accuracy, many of the measurements made in semiconductor fabs are not traceable to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824699

37. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

38. Comparison of Measurement Techniques for Advanced Photomask Metrology
Published: 3/24/2008
Authors: Stewart Smith, Martin McCallum, Andrew Hourd, J. Tom Stevenson, Anthony J Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W Cresswell, Ndubuisi George Orji
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904605

39. Towards Accurate Feature Shape Metrology
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824629

40. Comparison of SEM and HRTEM CD Measurements Extracted from Test-Structures Having Feature Linewidths from 40 nm to 240 nm
Published: 1/1/2008
Authors: Michael W Cresswell, Richard A Allen, William F Guthrie, Christine E. Murabito, Ronald G Dixson, Amy Hunt
Abstract: CD (Critical Diminsion) measurements have been extracted from SEM (Scanning Electron Microscopy) and HRTEM (High Resolution Transmission Electron Microscopy) images of the same set of monocrystalline silicon features having linewidths between 40 nm a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32240



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