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Author: ronald dixson

Displaying records 11 to 20 of 116 records.
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11. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

12. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

13. Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology
Published: 4/4/2012
Authors: Richard M Silver, Jing Qin, Bryan M Barnes, Hui H. Zhou, Ronald G Dixson, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for critical dimension measurements, defect detection and for potential use with in-die metrology applications. Sensitivity to nanometer sca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911039

14. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

15. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

16. A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy
Published: 7/31/2011
Authors: Richard M Silver, Nien F Zhang, Bryan M Barnes, Jing Qin, Hui H. Zhou, Ronald G Dixson
Abstract: We present a method to combine measurements from different techniques that reduces uncertainties and can improve measurement throughput. The approach directly integrates the measurement analysis of multiple techniques that can include different conf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908377

17. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: 6/6/2011
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NI ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908552

18. A Traceable Scatterometry Measurement of a Silicon Line Grating
Published: 5/26/2011
Authors: Thomas Avery Germer, Heather J Patrick, Ronald G Dixson
Abstract: In this paper, we present a spectroscopic Mueller matrix ellipsometry measurement of a silicon line grating with nominal pitch of 600 nm and line width 100 nm. An uncertainty analysis is performed on the measurement results. The results are compare ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908506

19. Progress on CD-AFM tip width calibration standards
Published: 5/10/2011
Authors: Ronald G Dixson, Boon Ping Ng, Craig Dyer McGray, Ndubuisi George Orji, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) is developing a new generation of standards for calibration of CD-AFM tip width. These standards, known as single crystal critical dimension reference materials (SCCDRM) have features with ne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911343

20. Nested Uncertainties and Hybrid Metrology to Improve Measurement Accuracy
Published: 4/18/2011
Authors: Richard M Silver, Nien F Zhang, Bryan M Barnes, Hui H. Zhou, Jing Qin, Ronald G Dixson
Abstract: In this paper we present a method to combine measurement techniques that reduce uncertainties and improve measurement throughput. The approach has immediate utility when performing model-based optical critical dimension measurements. When modeling ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908290



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