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Author: ronald dixson

Displaying records 111 to 116.
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111. Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts
Published: 1/1/1996
Authors: V W. Tsai, Theodore Vincent Vorburger, P Sullivan, Ronald G Dixson, Richard M Silver, Edwin Ross Williams, J Schneir
Abstract: The decreasing feature dimensions required in the semiconductor manufacturing industry are placing ever increasing demands upon metrology instruments. Atomic force microscopes (AFMs), which can have ~1 nm lateral resolution and sub-angstrom vertical ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820827

112. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820798

113. Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM
Published: 1/1/1996
Authors: Ronald G Dixson, Theodore Vincent Vorburger, P Sullivan, V W. Tsai, T Mcwaid
Abstract: Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control. Common types of measurements are those of feature spacing (pitch), feature height (or depth), ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820790

114. Progress on Accurate Metrology of Pitch, Height, Roughness, and Width Artifacts Using an Atomic Force Microscope
Published: 5/1/1995
Authors: J Schneir, T Mcwaid, Ronald G Dixson, V W. Tsai, John S Villarrubia, Edwin Ross Williams, E Fu
Abstract: NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology. NIST has initiated projects addressing some of the needs identified. When complete, these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820763

115. Increasing the Value of Atomic Force Microscopy Process Metrology Using a High-Accuracy Scanner, Tip Characterization, and Morphological Image Analysis
Published: 1/1/1995
Authors: J Schneir, John S Villarrubia, T Mcwaid, V W. Tsai, Ronald G Dixson
Abstract: Atomic force microscopes are being used increasingly for process metrology. As a case study, the measurement by atomic force microscope of a soda lime glass optical disk patterned using optical lithography and reactive plasma etching is examined. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820816

116. In Situ Tip Characterization for AFM and Application to Linewidth Metrology
Published: 1/1/1994
Authors: Ronald G Dixson, J Schneir, T Mcwaid, Theodore Vincent Vorburger
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901972



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