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You searched on: Author: john dagata

Displaying records 11 to 20 of 66 records.
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11. Faradaic Current Detection During Anodic-Oxidation of the H-Passivatedp-Si(001) Surface With Controlled Relative Humidity
Published: 3/1/2004
Authors: H Kuramochi, F Perez-murano, John A Dagata, H Yokoyama
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823177

12. A Multiscale Fabrication Approach to Microfluidic System Development
Published: 1/1/2004
Authors: Tony L Schmitz, John A Dagata, Brian S. Dutterer, W G Sawyer
Abstract: Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821973

13. Lithography With Self-Assembled Copolymer Microdomains
Published: 1/1/2004
Authors: C Harrison, John A Dagata, P Adamson
Abstract: There are many research groups working on copolymer lithography;many more have expressed interest in joining the field.Researchers who are new to this area will find the broad reviewof copolymer thin films by Fasolka and Mayes to be a highlyvaluable ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852143

14. Lithography with Self-Assembled Block Copolymer Microdomains
Published: 1/1/2004
Authors: C Harrison, John A Dagata, P Adamson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853929

15. Faradaic Current Detection During Anodic Oxidation of the H-Passivated p-Si(001) Surface with Controlled Relative Humidity
Published: 12/19/2003
Authors: H Kuramochi, F Perez-murano, John A Dagata, H Yokoyama
Abstract: Faradaic current during anodic oxidation is measured over a relative humidity range of 40¿70% using an atomic force microscope with humidity control. The level of detected current during the fabrication of oxide dots on H-passivated Si(001) is in the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822242

16. Nanoscale Oxidation of Zirconium Surfaces: Kinetics and Mechanisms
Published: 7/1/2003
Authors: Natalia Farkas, Li Zhang, E A Evans, R Ramsier, John A Dagata
Abstract: We show that AFM-induced oxide features can be reproducibly formed on both Zr and ZrN surfaces, and that the growth rate decreases rapidly with increasing time. There is an increase in oxide-feature height with humidity for both systems, and an appro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821960

17. Workshop Summary Report: Scanning Probe Nanolithography Workshop
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7040
Published: 1/1/2003
Authors: John A Dagata, H Yokoyama, F Perez-murano
Abstract: A workshop on Scanning Probe Microscope (SPM)-based Nanolithography was held at NIST Gaithersburg on November 24-25, 2003.  The meeting was sponsored by the Precision Engineering Division, Manufacturing Engineering Laboratory, NIST, under a Rese ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823167

18. Silicon Nanostructures Fabricated by Scanning Probe Oxidation and Tetramethyl Ammonium Hydroxide Etching
Published: 6/15/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and reli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821774

19. Silicon Nanostructures Fabricated by Scanning Probe Lithography and TMAH Etching
Published: 1/1/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and rel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823149

20. Nanomachining of Si with Si3N4 Masks Patterned by Scanning
Published: 11/1/2001
Authors: F S Chien, John A Dagata, W F Hsieh, S Gwo
Abstract: We demonstrate that local oxidation of silicon nitride films deposited on conductive substrates with a conductive-probe atomic force microscope (AFM) is a very promising approach for nanofabrication. Scanning Auger microscopy and spectroscopy are emp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821690



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