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Author: ravikiran attota

Displaying records 31 to 38.
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31. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823206

32. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822387

33. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

34. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

35. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

36. Calibration Strategies for Overlay and Registration Metrology
Published: 5/1/2003
Authors: Richard M Silver, Michael T. Stocker, Ravikiran Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821977

37. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822023

38. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models
Published: 7/1/2002
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, Jay Shi Jun, Egon Marx, Robert D. Larrabee, B Russo, M P Davidson
Abstract: In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821754



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