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You searched on: Author: ravikiran attota

Displaying records 31 to 40 of 45 records.
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31. Line Width Measurement Technique Using Through-Focus Optical Images
Published: 1/1/2008
Authors: Ravikiran Attota, Richard M Silver, Ronald G Dixson
Abstract: We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at differen ...

32. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...

33. Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons
Published: 6/18/2007
Authors: Richard M Silver, Ravikiran Attota, Egon Marx
Abstract: This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) ...

34. Calibrated Overlay Wafer Standard
Series: Special Publication (NIST SP)
Report Number: 260-165
Published: 1/1/2007
Authors: Michael T. Stocker, Richard M Silver, Ravikiran Attota, Jay Shi Jun
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 5000, provides guidance for its use in calibrating overlay (OL) tools, and gives information and precautions concerning its care and handling.Standard Reference M ...

35. Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study
Published: 1/1/2007
Authors: Richard M Silver, Thomas Avery Germer, Ravikiran Attota, Bryan M Barnes, B Bunday, J Allgair, Egon Marx, Jay Shi Jun
Abstract: This paper is a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry.  The project was focused on two primary elements: 1) the comparison, stability, and validity of indu ...

36. Optical Critical Dimension Measurement and Illumination Analysis using the Through-focus Focus Metric
Published: 3/24/2006
Authors: Ravikiran Attota, Richard M Silver, M R Bishop, Ronald G Dixson
Abstract: In this paper we present utility of the out of focus optical microscope images for metrology applications as opposed to the best focus images. Depending on the type of analysis, considerable beneficial information can be deduced from the out of focus ...

37. Koehler Illumination for High-Resolution Optical Metrology
Published: 3/1/2006
Authors: Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran Attota, Michael T. Stocker
Abstract: Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...

38. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...

39. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...

40. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...

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