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You searched on: Author: ravikiran attota

Displaying records 11 to 20 of 46 records.
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11. TSV REVEAL HEIGHT AND BUMP DIMENSION METROLOGY BY THE TSOM METHOD: FROM NANOMETER TO MICROMETER SCALE
Published: 1/23/2013
Authors: Ravikiran Attota, Victor Vertanian, Steve Olson, Robert Edgeworth, Iqbal Ali, Craig Huffman, Pate Moschak, Harry Lazier, Elizabeth Lorenzini
Abstract: The exceptional z-height resolution of TSOM, as well as very fast measurement time, is particularly important for high volume manufacturing. These two attributes make TSOM advantageous for 3D-stacked IC measurements of TSV reveal structures, and C4 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912923

12. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

13. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

14. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

15. Optical microscope angular illumination analysis
Published: 3/7/2012
Author: Ravikiran Attota
Abstract: For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we dem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910145

16. Through-focus Scanning Optical Microscopy
Published: 12/31/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) method provides three-dimensional information (i.e. the size, shape and location) about micro- and nanometer-scale structures. TSOM, based on a conventional optical microscope, achieves this by acquiri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908493

17. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

18. Three-dimensional Nanometrology with TSOM Optical Method
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

19. TSOM Method for Nanoelectronics Dimensional Metrology
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

20. Controlling Formation of Atomic Step Morphology on Micro-patterned Si (100)
Published: 8/9/2011
Authors: Kai Li, Pradeep Narayanan Namboodiri, Sumanth B. Chikkamaranahalli, Gheorghe Stan, Ravikiran Attota, Joseph Fu, Richard M Silver
Abstract: Micro scale features are fabricated on Si (100) surfaces using lithographic techniques and then thermally processed in an ultra high vacuum (UHV) environment. Samples are flash heated at 1200 °C and further annealed at 1050 °C for 18 hours. The surf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907301



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