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Author: ravikiran attota

Displaying records 11 to 20 of 38 records.
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11. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Published: 12/21/2011
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

12. Three-dimensional Nanometrology with TSOM Optical Method
Published: 12/10/2011
Author: Ravikiran (Ravikiran) Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

13. TSOM Method for Nanoelectronics Dimensional Metrology
Published: 11/18/2011
Author: Ravikiran (Ravikiran) Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

14. Controlling Formation of Atomic Step Morphology on Micro-patterned Si (100)
Published: 8/9/2011
Authors: Kai Li, Pradeep Narayanan Namboodiri, Sumanth B. Chikkamaranahalli, Gheorghe Stan, Ravikiran (Ravikiran) Attota, Joseph Fu, Richard M Silver
Abstract: Micro scale features are fabricated on Si (100) surfaces using lithographic techniques and then thermally processed in an ultra high vacuum (UHV) environment. Samples are flash heated at 1200 °C and further annealed at 1050 °C for 18 hours. The surf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907301

15. Dimensional Analysis of Through Silicon Vias Using the TSOM Method
Published: 7/12/2011
Authors: Ravikiran (Ravikiran) Attota, Andrew Rudack
Abstract: There is a great need for accurate, truly-3D metrology solutions that can be used for analysis of high aspect ratio features such as through-silicon-vias (TSVs). Through-focus scanning optical microscopy (TSOM) is an optical metrology method that pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909226

16. TSOM Method for Semiconductor Metrology
Published: 4/18/2011
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

17. Characterizing a Scatterfield Optical Platform for Semiconductor Metrology
Published: 12/21/2010
Authors: Bryan M Barnes, Ravikiran (Ravikiran) Attota, Richard Quintanilha, Martin Y Sohn, Richard M Silver
Abstract: Scatterfield microscopy is the union of a high-magnification imaging platform and the angular and/or wavelength control of scatterometry at the sample surface. Scatterfield microscopy uses Köhler illumination, where each point on the source translat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905931

18. Nanoscale Measurements With the TSOM Optical Method
Series: OTHER
Published: 1/4/2010
Author: Ravikiran (Ravikiran) Attota
Abstract: A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904673

19. Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope
Published: 7/15/2009
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Thomas Avery Germer
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope, by analyzing through-focus scanning-optical-microscope (TSOM) images obtained at different focus positions. In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902707

20. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran (Ravikiran) Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui H. Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294



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