Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publications Portal

You searched on: Author: ravikiran attota

Displaying records 11 to 20 of 47 records.
Resort by: Date / Title


11. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

12. TSV REVEAL HEIGHT AND BUMP DIMENSION METROLOGY BY THE TSOM METHOD: FROM NANOMETER TO MICROMETER SCALE
Published: 1/23/2013
Authors: Ravikiran Attota, Victor Vertanian, Steve Olson, Robert Edgeworth, Iqbal Ali, Craig Huffman, Pate Moschak, Harry Lazier, Elizabeth Lorenzini
Abstract: The exceptional z-height resolution of TSOM, as well as very fast measurement time, is particularly important for high volume manufacturing. These two attributes make TSOM advantageous for 3D-stacked IC measurements of TSV reveal structures, and C4 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912923

13. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

14. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

15. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

16. Optical microscope angular illumination analysis
Published: 3/7/2012
Author: Ravikiran Attota
Abstract: For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we dem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910145

17. Through-focus Scanning Optical Microscopy
Published: 12/31/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) method provides three-dimensional information (i.e. the size, shape and location) about micro- and nanometer-scale structures. TSOM, based on a conventional optical microscope, achieves this by acquiri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908493

18. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

19. Three-dimensional Nanometrology with TSOM Optical Method
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

20. TSOM Method for Nanoelectronics Dimensional Metrology
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series