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Author: richard allen

Displaying records 91 to 100 of 120 records.
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91. Extraction of Sheet-Resistance from Four-Terminal Sheet Resistors in Monocrystalline Films Having Non- Planar Geometries
Published: 12/31/1998
Authors: Michael W Cresswell, Nadine Guillaume, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, James C. OwenI, Z. Osborne, N. Sullivan, Loren W. Linholm
Abstract: This paper describes methods for the extraction of sheet resistance from V/I measurements made on four-terminal sheet resistors incorporated into electrical linewidth test structures patterned with non-planar geometries in monocrystalline silicon-on- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28180

92. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference-Material Applications
Published: 5/1/1998
Authors: Michael W Cresswell, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, Loren W. Linholm, J. J. Sniegowski
Abstract: The physical widths of reference features incorporated into electrical linewidth test structures patterned in films of mono-crystalline silicon have been determined from Kelvin voltage measurements. The films in which the test structures are pattern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18597

93. Temperature Dependence of the Modulation of Electrical Llinewidth of Single-Crystal Critical Dimension Artifacts
Published: 3/1/1998
Authors: Richard A Allen, O. Oyebanjo, Michael W Cresswell, Loren W. Linholm
Abstract: Single-crystal critical dimension (CD) test structures for reference material applications, with features defined using lattice-plane selective etching, are under development at NIST. The materials are intended to eliminate methods divergence betwee ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18188

94. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference Material Applications
Published: 12/31/1997
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, William F Guthrie, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7227

95. Reference-Length Shortening by Kelvin Voltage in Linewidth Test Structures Replicated in Mono-Crystalline Silicon Films
Published: 12/31/1997
Authors: W. F. Lee, William F Guthrie, Michael W Cresswell, Richard A Allen, J. J. Sniegowski, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3491

96. Hybrid Optical-Electrical Overlay Test Structure
Published: 5/1/1997
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, William B. Penzes, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23722

97. Critical Dimension Metrology for MEMS Processes Using Electrical Techniques
Published: 12/31/1996
Authors: Richard A Allen, Janet M Cassard
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20769

98. Electrical Test Structures Replicated in Silicon-on-Insulator Material
Published: 12/31/1996
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, Loren W. Linholm, John S Villarrubia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8218

99. Hybrid Optical-Electrical Overlay Test Structure
Published: 12/31/1996
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7729

100. Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes
Published: 12/31/1996
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, William F Guthrie, A. W. Gurnell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27620