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Author: richard allen

Displaying records 91 to 100 of 124 records.
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91. Extraction of Sheet-Resistance from Four-Terminal Sheet Resistors in Monocrystalline Films Having Non- Planar Geometries
Published: 5/1/1999
Authors: Michael W Cresswell, Nadine Guillaume, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, James C. OwenI, Z. Osborne, N. Sullivan, Loren W. Linholm
Abstract: This paper describes methods for the extraction of sheet resistance from V/I measurements made on four-terminal sheet resistors incorporated into electrical linewidth test structures patterned with non-planar geometries in monocrystalline silicon-on- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14902

92. Sheet and Line Resistance of Patterned SOI Surface Film CD Reference Materials as a Function of Substrate Bias
Published: 4/1/1999
Authors: Richard A Allen, Eric M. Vogel, Loren W. Linholm, Michael W Cresswell
Abstract: Recently, NIST has been developing electrical test structures to serve as a critical dimension (CD) reference artifacts for calibrating CD metrology systems. The reference artifacts are fabricated in monocrystalline silicon-on-insulator films and are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24743

93. Comparison of Properties of Electrical Test Structures Patterned in BESOI and DIMOX Films for CD Reference-Material Applications
Published: 12/31/1998
Authors: Richard A Allen, Rathindra Ghoshtagore, Michael W Cresswell, Loren W. Linholm
Abstract: The National Institute of Standards and Technology is exploring the feasibility of using artifacts fabricated on silicon-on-insulator materials (SOI) to quantify methods divergence, for critical dimension metrology applications. Test structures, pat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=17998

94. Evaluation of Surface Depletion Effects in Single-Crystal Test Structures for Reference Materials Applications
Published: 12/31/1998
Authors: Richard A Allen, Rathindra Ghoshtagore
Abstract: Monocrystalline silicon test structures are being investigated for critical dimension (CD) reference materials applications. The goal of this work is to produce samples which do not exhibit the phenomenon of methods divergence, where the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=19784

95. Extraction of Sheet-Resistance from Four-Terminal Sheet Resistors in Monocrystalline Films Having Non- Planar Geometries
Published: 12/31/1998
Authors: Michael W Cresswell, Nadine Guillaume, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, James C. OwenI, Z. Osborne, N. Sullivan, Loren W. Linholm
Abstract: This paper describes methods for the extraction of sheet resistance from V/I measurements made on four-terminal sheet resistors incorporated into electrical linewidth test structures patterned with non-planar geometries in monocrystalline silicon-on- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28180

96. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference-Material Applications
Published: 5/1/1998
Authors: Michael W Cresswell, Richard A Allen, William F Guthrie, Rathindra Ghoshtagore, Loren W. Linholm, J. J. Sniegowski
Abstract: The physical widths of reference features incorporated into electrical linewidth test structures patterned in films of mono-crystalline silicon have been determined from Kelvin voltage measurements. The films in which the test structures are pattern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18597

97. Temperature Dependence of the Modulation of Electrical Llinewidth of Single-Crystal Critical Dimension Artifacts
Published: 3/1/1998
Authors: Richard A Allen, O. Oyebanjo, Michael W Cresswell, Loren W. Linholm
Abstract: Single-crystal critical dimension (CD) test structures for reference material applications, with features defined using lattice-plane selective etching, are under development at NIST. The materials are intended to eliminate methods divergence betwee ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18188

98. Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference Material Applications
Published: 12/31/1997
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, William F Guthrie, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7227

99. Reference-Length Shortening by Kelvin Voltage in Linewidth Test Structures Replicated in Mono-Crystalline Silicon Films
Published: 12/31/1997
Authors: W. F. Lee, William F Guthrie, Michael W Cresswell, Richard A Allen, J. J. Sniegowski, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3491

100. Hybrid Optical-Electrical Overlay Test Structure
Published: 5/1/1997
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, William B. Penzes, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23722



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