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Author: david allen

Displaying records 31 to 40 of 46 records.
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31. Effects of Wafer Emissivity on Lightpipe Radiometry in RTP Tools
Published: 1/1/2001
Authors: K G Kreider, David W Allen, D H Chen, D P DeWitt, C W Meyer, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104581

32. Radiometric Calibration of the Scripps Earth Polychromatic Imaging Camera, ed. by W.L. Barnes
Published: 1/1/2001
Authors: E A. Early, B C Bush, Steven W Brown, David W Allen, Bettye C Johnson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104423

33. Chamber Radiation Effects on Calibration of Radiation Thermometers With a Thin-Film Thermocouple Test Wafer
Published: 6/1/1999
Authors: Benjamin K Tsai, D P DeWitt, Francis John Lovas, Kenneth Gruber Kreider, Christopher W Meyer, David W Allen
Abstract: In the semiconductor industry, Rapid Thermal Processing (RTP) utilizes a prescribed temperature-time recipe to silicon wafers undergoing processes such as annealing and oxide film formation. The National Technology Roadmap for Semiconductors (NTRS) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841364

34. Chamber Radiation Effects on Calibration of Radiation Thermometers with a Thin-Film Thermocouple Test Wafer, ed. by J.F. Dubbeldam and M.J. de Groot
Published: 1/1/1999
Authors: Benjamin K Tsai, D P DeWitt, Francis John Lovas, K G Kreider, C W Meyer, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104792

35. ITS-90 Calibration of Radiometers Using Wire/Thin-Film Thermocouples in the NIST RTP Tool: Experimental Procedures and Results
Published: 1/1/1999
Authors: C W Meyers, David W Allen, D P DeWitt, K G Kreider, Francis John Lovas, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104616

36. Heat Transfer in Turbulent Supercritical Carbon Dioxide Flowing in a Heated Horizontal Tube
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6234
Published: 9/1/1998
Authors: Douglas A Olson, David W Allen
Abstract: We report measurements of heat transfer coefficients of flowing supercritical carbon dioxide (7.38 MPa critical pressure, 31.1 degrees C critical temperature) in a heated horizontal tube. The tube was 10.9 mm ID, was heated over 274 cm, and had an u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830608

37. RTP Calibration Wafer Using Thin-Film Thermocouples
Published: 4/1/1998
Authors: Kenneth Gruber Kreider, D P DeWitt, Benjamin K Tsai, Francis John Lovas, David W Allen
Abstract: Rapid thermal processing (RTP) is a key technology for the cluster tool, single wafer manufacturing approach that is used to produce integrated circuits at lower cost with reduced line widths and thermal budgets. However, various problems associate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830603

38. Calibration Wafer for Temperature Measurement in RTP Tools
Published: 1/1/1998
Authors: K G Kreider, D P DeWitt, Benjamin K Tsai, Francis John Lovas, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104583

39. RTP Calibration Wafer Using Thin-Film Thermocouples, ed. by M.C. Ozturk, F. Roozeboom, P.J. Timans, and S.H. Pas
Published: 1/1/1998
Authors: K G Kreider, D P DeWitt, Benjamin K Tsai, Francis John Lovas, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104582

40. In-Chamber Thermometry Calibration using a Silicon Proof-Wafer
Published: 1/1/1997
Authors: Benjamin K Tsai, Francis John Lovas, D P DeWitt, K G Kreider, G W Burns, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104794



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