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A multilayer mirror is prepared for testing by NIST physicist Charlie Tarrio. NIST measurements of how efficiently these mirrors reflect extreme ultraviolet light will help researchers and manufacturers optimize the systems used to produce the next generation of semiconductor microcircuits. |
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National Extreme Ultraviolet Reflectometry Facility Copyright is owned by the photographer. This photo is available without charge for use in materials that describe NIST programs directly. All other uses require permission from the photographer. For further information or to receive a high resolution version of this image contact: Gail Porter, (301) 975-3392 |
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