NIST Conference Program home page

Sponsors:	National Institute of Standards and Technology (NIST), Manufacturing Engineering Laboratory, Precision Engineering Division 821, and Chemical Science and Technology Laboratory Surface and Microanalysis Science Division 837.
Audience:	Microscopists using scanned probe instruments such as scanning electron microscopes, atomic force microscopy, scanning tunneling microscopy, confocal microscopy, helium ion microsc.
Format:	Conference.
Purpose:	The SCANNING 2008 meeting will bring microscopists from all phases of scanning microscopies (from scanned optics to scanned particle beams) together in a single forum to discuss current research and new advancements in the field.
Background:	Spring conferences on scanning microscopy have a history going back to 1967 with the "Scanning Electron Microscopy" series started by Dr. Om Johari. Following Dr Johari's retirement, the SCANNING series of conferences organized by Tony Bourgholtzer of the Foundation for Advances in Medicine and Science (FAMS), continued this tradition. Early in 2007, FAMS decided not to sponsor future SCANNING meetings. Since the FAMS announcement following SCANNING 2007, a substantial amount of work has been done in the background to find a solution to keep the meeting alive and one has appeared. SCANNING or a similarly named meeting will be organized through SPIE (the International Society for Optical Engineering) starting in 2009. As a bridge to the future of SCANNING, a spring scanning microscopy meeting will be held at the National Institute of Standards and Technology (NIST) in Gaithersburg, Maryland, April 15 17, 2008 (Tuesday-Thursday), with a one-day pre-meeting Advancements in Electron Microscopy which is a Hitachi High Technology America, Inc., National Nanotechnology Seminar on Monday, April 14, 2008 organized by Hitachi High Technology.
Special Feature :	NIST will provide tours of selected technical facilities related to conference topics, including the Helium Ion Microscope, High Speed X-ray Mapping with the Silicon Drift Detector on a Thermal FEG, micro-X-ray Fluorescence X-ray Spectrum Imaging, and others.
Topics:	Forensic Applications of SEM Scanning ion microscopy (FIB and HIM) Quality assurance in SEM and micro characterization Silicon Drift Detectors: The New EDS Biological Environmental/Variable Pressure SEM: successes and limitations Modeling for Critical SEM and Microanalysis Applications Scanned probe microscopies Scanned optical microscopies
Registration Contact:	Teresa Vicente, NIST, phone: 301/975-3883, email: teresa.vicente@nist.gov
Technical Contact:	Michael Postek, NIST, phone: 301/975-3463, email: michael.postek@nist.gov Frank Platek, FDA, phone: 513/679-2700, ext. 254 Dale Newbury, NIST, phone: 301/975-3921, email: dale.newbury@nist.gov
Website:	Homepage is in progress.
Registration:	On-Line Registration Full Fee: $300 Student Fee: $100 Full Fee + 1-day Short Course ($400.00 ) Registration closed on April 8, 2008 All request for cancellation and refund must be submitted in writing, prior to April 8, 2008
Accommodation:	A block of rooms has been reserved for the nights of April 14-16, 2008 at the Hilton Hotel at 620 Perry Parkway, Gaithersburg, Maryland. The special rate is $149.00 per night plus 12% tax. To make reservation, please contact the hotel directly at 301/977-8900 by March 25, 2008. and mention that you are attending the "NIST/ Scanning 2008". Transportation will be provided between NIST and the Hilton Hotel on each morning and afternoon. Local Information, Transportation, Weather & Directions to NIST: http://www.nist.gov/public_affairs/visitor/visitor.htm