R&D To Deliver Practical Results: Extending Moore's Law William Holt Monday, June 11, 2007 |
Over forty years after its introduction, Moore’s Law continues to be the best predictor of future trends in silicon process scaling. Significant shifts in technology have occurred during this time to achieve increased performance and power efficiency. Advances in materials, processes, device structures, architectures, packages and systems will continue to enable the future.
A research and development approach that leverages university and consortium research along with a strong, targeted, internal research organization will be discussed. The required investments necessitate a smooth transfer of ideas into development, and from development into high volume manufacturing. Use of integrated development and manufacturing capabilities enables co-optimizing the end product and manufacturing process. The model will be validated by considering Intel products and technical results.
Anyone outside NIST wishing to attend must be sponsored by a NIST employee and receive a visitor badge. For more information, call Kum J. Ham at 301-975-4203.
Colloquia are videotaped and available in the NIST Research Library.
Last updated: June 11, 2007
Contact: inquiries@nist.gov
