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Conferences, Seminars, and Workshops

Welcome to the Semiconductor and Dimensional Metrology Division (683) of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST) that is providing the foundation of dimensional measurement that meets the needs of the industrial and scientific communities. MMD staff and associates participate in a variety of conferences, seminars, and workshops.

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      Nanoscale Measurements with the TSOM Optical Method
nanoscale measurements with the tsom optical method  Date: November 18, 2009
Speaker: Attota, Ravikiran
Location: NIST, Gaithersburg, MD 20899
Author: Attota, Ravikiran
Abstract: A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions will be presented. This technique has potential to identify which dimension is changing between two nanosized targets and to determine the dimension using a library-matching method. Nanometer level experimental sensitivity will be presented. This methodology has utility for a wide range of target geometries and application areas, including nanomanufacturing, defect analysis, semiconductor process control, and biotechnology.