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The Nanoelectronic Device Metrology (NEDM) project is developing the measurement science infrastructure that will enable innovation and advanced manufacturing of emerging nanoelectronic information processing technologies – including those based upon new computational state variables – to more rapidly enter into the marketplace.
Figure 1. Christina Hacker characterizes the individual monolayers prior to flip-chip lamination using a Fourier transform infrared spectrometer.
The Nanoelectronic Device Metrology project conducts research to develop and advance the measurements needed to understand and evaluate properties of promising nanoelectronic technologies. This involves pioneering research in the area of molecular interfaces, condensed matter physics, alternate means of computing, and confined structures (graphene, 2D materials, nanowires, etc.). Particular emphasis is placed on novel measurements of chemical, physical, and electrical properties to fully interrogate nanoelectronic systems and provide the measurement foundation for advanced manufacturing of innovative future nanoelectronic devices. Core competencies include developing surface, electrical, and magnetic characterization approaches to accelerate the development and characterization of advanced nanoelectronic devices.
The NEDM project focuses on understanding the factors that govern charge transport in nanoelectronic devices. To do this, team members focus on novel measurement approaches such as investigating electronic devices at low-temperature or in the presence of a magnetic field. This work is an integral component to the condensed matter physics foundation needed for novel electronic materials (e.g., graphene) and alternate means of computing (e.g., spin) to become a manufactural reality.
The NEDM project has extensive expertise in molecular electronics foundations including the formation and characterization of molecular layers and fabrication and qualification of electrode-molecule-electrode junctions which feed into to a fundamental understanding of charge transport at molecular interfaces. This work has led to many technological advances on the nanoscale and has recently been applied to fabricate and understand the physics governing novel organic spintronic devices.
The NEDM aims to develop the required measurement infrastructure and scientific knowledge-base to address technology barriers and enable the successful development and subsequent manufacture of next-generation "Beyond CMOS technologies." To do this, the NEDM project supplements our core expertise with collaborations within the nanoelectronics group, across NIST, and with external technical leaders to conduct timely, impactful research.
Figure 2. Richter (left) and Jang (right) measuring the spin-valve effect of a device.
Lead Organizational Unit:pml
Being at the fore-front of nanoelectronic metrology with a deep knowledge and measurement infrastructure means we are often sought out. In addition, industry (particularity the NRI) enjoys working with us on pre-competitive research, taking advantage of our status as an impartial federal lab with sought-after expertise. Below is a snap-shot of recent interactions. (George Mason, University of Notre Dame, Wake Forest, Columbia, Purdue, Catholic University, University of Maryland, Thermo Fisher Scientific, Lawrence Livermore National Labs, Brookhaven, Oak Ridge National labs, etc.)
Because the NEDM focuses on advancing novel measurements, there is a lot of specialized equipment and expertise within the project. The expertise is grouped largely along the lines of the two major activities, engineered molecular interfaces and nanoelectronic device physics as described in more detail below. The project contains world-class expertise and tools including:
Other External Facilities: Metrology of nanoelectronic devices and materials relies on our effective partnering as well as our direct use (e.g., Dr. Pookpanratana) of specialized tools at external facilities. More recently this has included specialized measurements done at synchrotron facilities.
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