The Nanoelectronic Device Metrology (NEDM) project is developing the measurement science infrastructure that will enable emerging “Beyond-CMOS” nanoelectronic information processing technologies – including those based upon new computational state variables – to more rapidly enter into the marketplace.
The semiconductor industry is a major driver of the modern economy and has accounted for a large portion of the productivity gains that have characterized the global economy since the 1990’s. In order for the semiconductor industry to maintain its position as one of the principle drivers of U.S. economic productivity, it requires the continuous development of ever faster computer chips offering greater functionality at a lower cost. These performance increases have traditionally been based upon scaling complementary metal oxide semiconductor (CMOS) devices, to ever smaller dimensions. Unfortunately, scaling is reaching fundamental limits. The grand challenge facing the semiconductor industry is to integrate new nm-scale materials and new nanoelectronic “switches” to extend the performance improvements associated with Moore’s law. To solve this challenge, the ITRS roadmap points to nanowires, carbon nanotubes, graphene, and molecular/organic electronics as promising new materials for use in moving beyond
The NEDM will develop the required measurement infrastructure and scientific knowledge-base to address technology barriers and enable the successful development and subsequent manufacture of next-generation “Beyond CMOS technologies.”
Richter (left) and Jang (right) measuring the spin-valve effect of a device.
Lead Organizational Unit:pml
Christina Hacker, Leader
100 Bureau Drive, M/S 8120