Frontiers of Characterization and Metrology for Nanoelectronics

Purpose:

The 2013 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled Characterization and Metrology for ULSI Technology) will be held March 25-28, 2013 at the National Institute of Standards and Technology (NIST), Gaithersburg, Maryland, USA. This conference, the ninth in the series, will focus on the frontiers and innovation in characterization and metrology of nanoelectronics.

The conference is sponsored by the National Institute of Standards and Technology, College of Nanoscale Science and Engineering, CEA-LETI, Semiconductor Research Corporation (SRC), International SEMATECH Manufacturing Initiative (ISMI), AVS, National Science Foundation (NSF), American Physical Society (APS), and IEEE/Electron Devices Society

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Committee Co-Chairs:

David Seiler, NIST
Alain Diebold, College of Nanoscale Science and Engineering, SUNY Albany
Bob McDonald, formerly of Intel (Treasurer)
George Thompson, Intel
Amal Chabli, LETI

Testimonials:

"There were a total of 34 talks and 81 poster presentations that summarized major issues and provided critical reviews of crucial semiconductor developments and techniques needed as the industry evolves to silicon nanoelectronics and beyond."

- Alex Braun, "A Jaunt Through Nanotechnopolis,"
Semiconductor International, May 20, 2009

"If you want to meet, greet, and learn from the world's experts in metrology, this is the place to be."

- Dan Hutcheson, The Chip Insider,
January 11, 2007