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Frontiers of Characterization and Metrology for Nanoelectronics

Purpose:

The 2015 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) was held at the Hilton Dresden Downtown in Dresden, Germany, April 14-16, 2015.

Dresden

The Conference:

While a city of notable art treasure, architectural sights, and a charming landscape, Dresden also has largest hub of microelectronics in Europe. Dresden is a center of materials science and engineering (more than 2000 materials scientists and engineers at TU Dresden and in several institutes).

The FCMN brought together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches were welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference summarized major issues and provided critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.

The conference consisted of formal invited presentation sessions and poster sessions for contributed papers. The poster papers covered new developments in characterization and metrology especially at the nanoscale.

The conference series began at NIST in 1995. There have been nine conferences in the series.

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Committee Co-Chairs:

  • David Seiler, NIST
  • Alain Diebold, College of Nanoscale Science and Engineering, SUNY Albany
  • Bob McDonald, formerly of Intel (Treasurer)
  • Zhiyong Ma, Intel
  • Ehrenfried Zschech, Fraunhofer Institute for Ceramic Technologies and Systems

Committee Members:

  • Amal Chabli, CEA-Leti
  • Luigi Colombo, TI
  • Michael Current, Current Scientific
  • Ajey Jacob, Global Foundries
  • Toshihiko Kanayama, AIST
  • Shifeng Lu, Micron
  • Ulrich Mantz, Zeiss
  • Lori S. Nye, Brewer Science, Inc.
  • Yaw Obeng, NIST
  • Lothar Pfitzner, Fraunhofer IISB
  • Sesh Ramaswami, Applied Materials
  • Erik Secula, NIST
  • George Thompson, Intel
  • Sandip Tiwari, Cornell University
  • Victor Vartanian, ISMI
  • Wilfried Vandervorst, IMEC
  • Usha Varshney, NSF

Speakers:

Bios and pictures for many of our invited speakers are available on-line here.

Testimonials:


"There were a total of 34 talks and 81 poster presentations that summarized major issues and provided critical reviews of crucial semiconductor developments and techniques needed as the industry evolves to silicon nanoelectronics and beyond."    

- Alex Braun, "A Jaunt Through Nanotechnopolis,"
Semiconductor International, May 20, 2009

 

"If you want to meet, greet, and learn from the world's experts in metrology, this is the place to be."    

- Dan Hutcheson, The Chip Insider,
January 11, 2007

Details:

Start Date: Tuesday, April 14, 2015
End Date: Thursday, April 16, 2015
Location: Hilton Dresden Downtown, Dresden, Germany
Audience: Industry, Government, Academia
Format: Conference

Technical Contact: