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Frontiers of Characterization and Metrology for Nanoelectronics

Purpose:

The location and dates for the 2015 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics will be announced here soon!

The 2013 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled Characterization and Metrology for ULSI Technology) was held March 25-28, 2013 at the National Institute of Standards and Technology (NIST), Gaithersburg, Maryland, USA. This conference, the ninth in the series, focused on the frontiers and innovation in characterization and metrology of nanoelectronics.

The conference was sponsored by the National Institute of Standards and Technology, College of Nanoscale Science and Engineering, CEA-LETI, Semiconductor Research Corporation (SRC), International SEMATECH Manufacturing Initiative (ISMI), AVS, National Science Foundation (NSF), American Physical Society (APS), and IEEE/Electron Devices Society

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Committee Co-Chairs:

  • David Seiler, NIST
  • Alain Diebold, College of Nanoscale Science and Engineering, SUNY Albany
  • Bob McDonald, formerly of Intel (Treasurer)
  • George Thompson, Intel
  • Amal Chabli, CEA-Leti

Committee Members:

  • Luigi Colombo, TI
  • Michael Current, Current Scientific
  • Bob Havemann, SRC
  • Dick Hockett, Evans Analytical Group Ltd
  • Ajey Jacob, Global Foundries
  • Toshihiko Kanayama, AIST
  • David Kyser, Applied Materials
  • Patricia Lindley, Evans Analytical Group
  • Shifeng Lu, Micron
  • Zhiyong Ma, Intel
  • Ulrich Mantz, Zeiss
  • Lori S. Nye, Brewer Science, Inc.
  • Yaw Obeng, NIST
  • Lothar Pfitzner, Fraunhofer IISB
  • Erik Secula, NIST
  • Sandip Tiwari, Cornell University
  • Victor Vartanian, ISMI
  • Wilfried Vandervorst, IMEC
  • Usha Varshney, NSF
  • Ehrenfried Zschech, Fraunhofer Institute for Non-Destructive Testing

Speakers:

We were pleased to have Mike Mayberry, VP and Director of Component Research, Intel; Naga Chandrasekaran, VP of Process R&D, Micron; and Gyeong-Su Park, Leader of Analytical Science Group, Samsung Advanced Institute of Technology, as keynote speakers for the event. Over 30 other invited talks offered overviews in the sessions that follow.

Testimonials:


"There were a total of 34 talks and 81 poster presentations that summarized major issues and provided critical reviews of crucial semiconductor developments and techniques needed as the industry evolves to silicon nanoelectronics and beyond."    

- Alex Braun, "A Jaunt Through Nanotechnopolis,"
Semiconductor International, May 20, 2009

 

"If you want to meet, greet, and learn from the world's experts in metrology, this is the place to be."    

- Dan Hutcheson, The Chip Insider,
January 11, 2007

Details:

Start Date: Monday, March 25, 2013
End Date: Thursday, March 28, 2013
Location: NIST, Gaithersburg, MD, USA - Administration Building, Green Auditorium
Audience: Industry, Government, Academia
Format: Conference

Registration:

The registration fee for the conference includes coffee breaks, lunches, a reception, a banquet, a barbecue, and an extended abstract booklet with CD-ROM. The Early Bird registration fee is $450. Students may register for $250. Early Bird registration ends on Feb. 15, 2013! After Feb. 15th, the registration fee will be $550.

Registration is now closed for this event.

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