Developing new
metrology to characterize nano-structures in thin film and membrane using X-ray reflectivity (SXR), small angle x-ray
scattering (SAXS), grazing incident small angle x-ray scattering (GI-SAXS) and small angle neutron scattering (SANS)
Study on the effects
of confinement geometry on crosslinking density of UV nanoimprint resist
Developing
advanced characterization methods for determining regular and irregular nano- and micro- scale patterns
using SXR as a pattern shape metrology
Developing novel
resist for high resolution e-beam lithography and fabricating reliable
nano-patterns using newly developed resist
Structural
characterization of porous thin films including porosity, average pore size,
pore connectivity, pore size distribution, matrix density, average film
density, and water uptake using SXR, SAXS, GI-SAXS, and SANS
Characterizing
surface and interfacial structures and density depth profiles of thin films
Awards and Honors
MSEL Distinguished Associate Award (2007)
Best Poster Award at MRS Spring Meeting (2001)
Gold Medal Award at Samsung Semiconductor R & D Center Conference (1995)
