Research Interests include:
Dr. Moffat is a member of the Thin Film and Nanostructure Processing Group in the Metallurgy Division at National Institute of Standards and Technology (NIST). He received B.E. and M.Sc. degrees from Vanderbilt University in 1982 and 1984, respectively and an Sc.D. degree in materials science and engineering from the Massachusetts Institute of Technology in 1989. He then spent two years as a postdoctoral associate in A.J. Bard’s laboratory at the University of Texas, Austin. Dr. Moffat joined NIST in 1991 to study thin film deposition processes. In 2001 he received the Gold Medal of the U.S. Department of Commerce for his work in the area of superconformal film growth. He is also the recipient of the 2006 Research Award of the Electrodeposition Division of The Electrochemical Society. He is an author or coauthor of more than 100 technical papers. Dr. Moffat is an active member of the Electrochemical Society, the International Society of Electrochemistry, the Materials Research Society and the American Association for the Advancement of Science. He will Chair the 2008 Gordon Research Conference on Electrodeposition. Currently he is exploring the use of electrochemical processing for advanced metallization in microelectronics, magnetic devices, and the synthesis of alloy electrocatalyst.
Thin Film and Nanostructure Processing
1991 - Present: Research Metallurgist, Metallurgy Division, NIST
1989 - 1991: Post-Doctoral Appointment, University of Texas, Austin
Sc.D. - Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, June 1989
M.S. - Materials Science and Engineering, Vanderbilt University, Nashville, TN, May 1984