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Jonathan E. Seppala

Research Interests

  • Fused deposition modeling (Additive Manufacturing)
  • Shear-thickening fluids
  • Rheology and scattering techniques

Previous Research Interests

  • Solution assembly of amphiphilic micelles
  • Block copolymer self-assembly in thin films
  • Polymer nanocomposites

Professional Affiliations

  • American Physical Society
  • Society of Rheology

Selected non-NIST Publications

J.E. Seppala, R.L. Lewis, T.H. Epps. Spatial and Orientation Control of Cylindrical Nanostructures in ABA Triblock Copolymer Thin Films by Raster Solvent Vapor Annealing, ACS Nano, 2012, 6(11), 9855-9862.

 

Jon Seppala (small)

Position:

Chemical Engineer
Materials Science and Engineering Division
Polymers and Complex Fluids Group

Employment History:

2014-Present: Chemical Engineer, Materials Science and Engineering Division, National Institute of Standards and Technology

2012-2014: Research Associate, Materials Science and Engineering Division, National Institute of Standards and Technology

2010-2012: Postdoctoral Researcher, University of Delaware

2008-2010: Visiting Scholar, University of Delaware

Education:

Ph.D., Chemical Engineering, Michigan State University

B.S., Chemical Engineering, Michigan Technological University

Contact

Phone: 301-975-2836
Email: jonathan.seppala@nist.gov
Fax: 301-975-4924