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Hae-Jeong Lee, Ph.D.

Research Interests

  • Developing new metrology to characterize nano-structures in thin film and membrane using X-ray reflectivity (SXR), small angle x-ray scattering (SAXS), grazing incident small angle x-ray scattering (GI-SAXS) and small angle neutron scattering (SANS)
  • Study on the effects of confinement geometry on crosslinking density of UV nanoimprint resist
  • Developing advanced characterization methods for determining regular and irregular nano- and micro- scale patterns using SXR as a pattern shape metrology
  • Developing novel resist for high resolution e-beam lithography and fabricating reliable nano-patterns using newly developed resist 
  • Structural characterization of porous thin films including porosity, average pore size, pore connectivity, pore size distribution, matrix density, average film density, and water uptake using SXR, SAXS, GI-SAXS, and SANS
  • Characterizing surface and interfacial structures and density depth profiles of thin films

Awards and Honors

MSEL Distinguished Associate Award (2007)
Best Poster Award at MRS Spring Meeting (2001)
Gold Medal Award at Samsung Semiconductor R & D Center Conference (1995)

Photo of Hae-Jeong Lee

Position:

Guest Researcher
Polymers Division
Electronics Materials

Employment History:

1999 – Present: Research Associate, Polymers Division, NIST

1994 – 1999: Senior Researcher, Semiconductor R & D Center, Samsung Electronics

Education:

Ph. D., Chemistry, Korea Advanced Institute of Science and Technology (KAIST) in Korea, 1994

B. S., Chemistry, Ewha Womans University in Korea, 1989

Contact

Phone: 301-975-8592
Email: hae-jeong.lee@nist.gov
Fax: 301-975-3928