Gery R. Stafford

Dr. Stafford is a member of the Thin Film and Nanostructure Processing Group in the Metallurgy Division at the National Institute of Standards and Technology (NIST). He earned his B.S. in chemical engineering from the University of Notre Dame and his PhD in materials science from the University of Virginia. From 1980 to 1986 he was a senior research engineer with Celanese Research Co., Summit, NJ, where he worked on electrogenerative processes and the development of polymeric separator materials for batteries and fuel cells. He joined NIST in 1986 and served as the Leader of the Electrochemical Processing Group from 1994 to 2005. Dr. Stafford's research interests focus on the application of electrochemical and analytical methods to understand electrodeposition processes. Recently he has developed an in situ wafer curvature method for studying surface and growth stress with resolution sufficient to study the adsorption of molecular monolayers onto the electrode surface. These measurements are particularly well-suited for studying underpotential metal deposition, self-assembled monolayers, and competitive adsorption processes. Dr. Stafford has authored over 80 technical papers and a book chapter on the electrodeposition of aluminum alloys from chloroaluminate ionic liquids. He is a member of the Materials Research Society, the American Chemical Society and a Fellow of the Electrochemical Society.

Research interests include:

• Surface and growth stress in thin films
• Electrocatalysis and fuel cells
• Structure and properties of electrodeposited thin films
• Electrodeposition of aluminum-based alloys from ionic liquids

 Awards and Honors (NIST):

• Department of Commerce Gold Medal - 2001
• Department of Commerce Bronze Medal - 1988

 Professional Societies:

• Fellow, The Electrochemical Society