Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo
Bookmark and Share

Kwang-woo Choi

Research Interests

EUV Photoresist, Application of CD-SAXS, High-K Materials, Mask Metrology, Reliability of Interconnect.

Brief Bio

Since 2005, Kwang-Woo Choi has worked with the NIST Polymers Division-Electronics Materials Group under an Intel-NIST CRADA to perform research in understanding line-width roughness (LWR) origins for extreme ultraviolet (EUV) photoresist and development/assessment of the CD-SAXS metrology. He also serves to facilitate and guide the knowledge transfer of the research performed at NIST to meet Intel's advanced technology needs.

Prior to his current position as an Intel assignee to NIST, Kwang-Woo Choi worked in Intel's California Technology Manufacturing, as a manager of the Fab Product Engineering group responsible for the overall management/coordination between the fab, assembly/test, and the division/design groups.

Photo of Kwang-Woo Choi


Visiting Industrial Scientist, Intel
Polymers Division
Electronics Materials Group

Employment History:

2005-Present Visiting Industrial Scientist (Intel)
Electronics Materials Group, Polymers Division, NIST


Phone: 301-975-6738
Email: kchoi@nist.gov
Fax: 301-975-3928