Figure 1(left): Hardness alteration at crystallinity boundary in a HfO2-TiO2-Y2O3 library thin film.; Figure 2(center): Statistical study of the material response (elastic, plastic, phase transformation) of Si(110) wafer as function of indentation force.; Figure 3(right): Map of stress component σxx around the spherical imprint in a Si(111) wafer.
Materials Measurement Science Division
Nanomechanical Properties Group
2006-present: NIST Associate, Ceramics Division, NIST
Ph.D., Engineering, University of Warwick, 2007