Figure 1 (left):Ceramics Division Divergent Beam Diffractometer (CDDBD) configured with Johansson incident beam monochromator.; Figure 2 (right): Suite of SRMs certified for calibration of diffraction measurements from powder and thin film structures.
Postdoctoral Research Opportunities in Diffraction Metrology & Standards
X-ray reflectometry (XRR) is used to characterize the thickness, density, and roughness of thin, nearly-smooth, deposited films, particularly in the microelectronics industry. XRR modeling is essential to interpreting XRR data. Opportunities exist for both model development (theory and programming of algorithms) and instrumentation (construction, optimization, calibration, and automation of equipment). For more information...
High-Resolution X-Ray Diffraction (HRXRD) is a powerful technique for characterizing epitaxial crystalline layers as used in many electronic, magnetic, and optical technologies. There are two distinct research areas for HRXRD measurements. One involves quantifying and optimizing the performance of the focusing optics needed for the technique. Another topic is modeling of HRXRD data, which requires dynamical scattering theory to interpret interference effects between epitaxial films and substrates Opportunities exist for both model development (theory and programming of algorithms) and for instrumentation (construction, optimization, calibration, and automation of equipment). For more information...
Awards and Honors
Structure Determination Methods Group
1988-present: Ceramics Engineer, Ceramics Division, NIST
Ph.D., Ceramics, Alfred University, NY, 1986